Chin. Phys. Lett.  1985, Vol. 2 Issue (6): 241-244    DOI:
Original Articles |
EELS INVESTIGATION ON RS a-SixC1-x: H ALLOY FILM
ZHANG Fang-qing;XU Xi-xiang;HE De-yan;CHEN Guang-hua
Department of Physics, Lanzhou University, Lanzhou
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ZHANG Fang-qing, XU Xi-xiang, HE De-yan et al  1985 Chin. Phys. Lett. 2 241-244
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Abstract EELS Technique is used to analyze the amorphous silicon-carbon-hydrogen alloy film deposited by RF sputtering method (RS a-SixC1-x: H). It is further verified that a structural change occurs at 1-x ≥ 0.40 in the alloy film.
Published: 01 June 1985
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XU Xi-xiang
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CHEN Guang-hua
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