Chin. Phys. Lett.  1985, Vol. 2 Issue (4): 165-168    DOI:
Original Articles |
A MODEL FOR SIMULATION OF THE COMPOSITION-DEPTH PROFILE OBTAINED BY ION SPUTTERING
QU Zhe;XIE Tian-sheng
Institute of Metal Research, Academia Sinica, Shenyang
Cite this article:   
QU Zhe, XIE Tian-sheng 1985 Chin. Phys. Lett. 2 165-168
Download: PDF(44KB)  
Export: BibTeX | EndNote | Reference Manager | ProCite | RefWorks
Abstract A model for describing the profiling process has been proposed based on the commonly used assumptions. The concentration and the depth of the sputtered element can be calculatted simultaneously by using the derived equations. The model is suitable not only for binary systems but also for multicomponent systems. It can be applied to the system where the inherent component distribution is constant or varies as a function of depth.
Published: 01 April 1985
TRENDMD:   
URL:  
https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y1985/V2/I4/0165
Service
E-mail this article
E-mail Alert
RSS
Articles by authors
QU Zhe
XIE Tian-sheng
Viewed
Full text


Abstract