Chin. Phys. Lett.  2018, Vol. 35 Issue (12): 126101    DOI: 10.1088/0256-307X/35/12/126101
CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
Blistering and Helium Retention of Tungsten and 5% Chromium Doped Tungsten Exposed to 60keV Helium Ions Irradiation
Shu-qin Lv1, Wen-jia Han1, Jian-gang Yu1, Hang Zhou1, Mi Liu1,2, Chang-an Chen3, Kai-gui Zhu1,2**
1Department of Physics, Beihang University, Beijing 100191
2Beijing Key Laboratory of Advanced Nuclear Energy Materials and Physics, Beihang University, Beijing 100191
3Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621907
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Shu-qin Lv, Wen-jia Han, Jian-gang Yu et al  2018 Chin. Phys. Lett. 35 126101
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Abstract Pure tungsten (W) and chromium doped W (W-5%Cr) are prepared by powder metallurgy. The microstructure, blistering and helium retention are investigated by x-ray diffraction, scanning electron microscopy, transmission electron microscopy and thermal desorption spectroscopy (TDS). These results show that the average size and density of helium blisters on the surface of pure W are much larger than those on the W-5%Cr alloy. Vacancy-impurity pairs can reduce the migration coefficients of vacancy and vacancy-helium complexes, and Cr may play a role of such an impurity. Moreover, the TDS result shows that the highest desorption peak moves to higher temperature, which is attributed to the He$_{m}$Cr$_{k}$V$_{n}$ complexes in the W-Cr alloy. In addition, the helium retention is found to be higher in W than in W-5%Cr.
Received: 18 July 2018      Published: 23 November 2018
PACS:  61.66.Dk (Alloys )  
  61.05.-a (Techniques for structure determination)  
  65.90.+i (Other topics in thermal properties of condensed matter)  
  28.52.Fa (Materials)  
  52.40.Hf (Plasma-material interactions; boundary layer effects)  
Fund: Supported by the National Natural Science Foundation of China under Grant Nos 51471015 and 11675010, and the National Magnetic Confinement Fusion Program under Grant No 2015GB109003.
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https://cpl.iphy.ac.cn/10.1088/0256-307X/35/12/126101       OR      https://cpl.iphy.ac.cn/Y2018/V35/I12/126101
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Shu-qin Lv
Wen-jia Han
Jian-gang Yu
Hang Zhou
Mi Liu
Chang-an Chen
Kai-gui Zhu
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