CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Curvature Correction of FWHM in the X-Ray Rocking Curve of Bent Heteroepitaxial Films |
WANG Liang-Ji1, ZHANG Shu-Ming1, WANG Yu-Tian1, JIANG De-Sheng1, ZHU Jian-Jun1, ZHAO De-Gang1, LIU Zong-Shun1, WANG Hui1, SHI Yong-Sheng1, WANG Hai1, LIU Su-Ying1, YANG Hui1,2 |
1State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 1000832Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123 |
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Cite this article: |
WANG Liang-Ji, ZHANG Shu-Ming, WANG Yu-Tian et al 2009 Chin. Phys. Lett. 26 076104 |
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Abstract A method for accurate determination of the curvature radius of semiconductor thin films is proposed. The curvature-induced broadening of the x-ray rocking curve (XRC) of a heteroepitaxially grown layer can be determined if the dependence of the full width at half maximum (FWHM) of XRC is measured as a function of the width of incident x-ray beam. It is found that the curvature radii of two GaN films grown on a sapphire wafer are different when they are grown under similar MOCVD conditions but have different values of layer thickness. At the same time, the dislocation-induced broadening of XRC and thus the dislocation density of the epitaxial film can be well calculated after the curvature correction.
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Keywords:
61.05.Cp
81.05.Ea
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Received: 30 October 2008
Published: 02 July 2009
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