Chin. Phys. Lett.  2009, Vol. 26 Issue (7): 076104    DOI: 10.1088/0256-307X/26/7/076104
CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
Curvature Correction of FWHM in the X-Ray Rocking Curve of Bent Heteroepitaxial Films
WANG Liang-Ji1, ZHANG Shu-Ming1, WANG Yu-Tian1, JIANG De-Sheng1, ZHU Jian-Jun1, ZHAO De-Gang1, LIU Zong-Shun1, WANG Hui1, SHI Yong-Sheng1, WANG Hai1, LIU Su-Ying1, YANG Hui1,2
1State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 1000832Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123
Cite this article:   
WANG Liang-Ji, ZHANG Shu-Ming, WANG Yu-Tian et al  2009 Chin. Phys. Lett. 26 076104
Download: PDF(369KB)  
Export: BibTeX | EndNote | Reference Manager | ProCite | RefWorks
Abstract A method for accurate determination of the curvature radius of semiconductor thin films is proposed. The curvature-induced broadening of the x-ray rocking curve (XRC) of a heteroepitaxially grown layer can be determined if the dependence of the full width at half maximum (FWHM) of XRC is measured as a function of the width of incident x-ray beam. It is found that the curvature radii of two GaN films grown on a sapphire wafer are different when they are grown under similar MOCVD conditions but have different values of layer thickness. At the same time, the dislocation-induced broadening of XRC and thus the dislocation density of the epitaxial film can be well calculated after the curvature correction.
Keywords: 61.05.Cp      81.05.Ea     
Received: 30 October 2008      Published: 02 July 2009
PACS:  61.05.cp (X-ray diffraction)  
  81.05.Ea (III-V semiconductors)  
TRENDMD:   
URL:  
https://cpl.iphy.ac.cn/10.1088/0256-307X/26/7/076104       OR      https://cpl.iphy.ac.cn/Y2009/V26/I7/076104
Service
E-mail this article
E-mail Alert
RSS
Articles by authors
WANG Liang-Ji
ZHANG Shu-Ming
WANG Yu-Tian
JIANG De-Sheng
ZHU Jian-Jun
ZHAO De-Gang
LIU Zong-Shun
WANG Hui
SHI Yong-Sheng
WANG Hai
LIU Su-Ying
YANG Hui
[1] Fatemi M 2002 Appl. Phys. Lett. 80 935
[2] Korbutowicz R, Kozlowski J, Dumiszewska E and SerafinczukJ 2005 Crystal Research and Technology 40 503
[3] Uschmann I et al 1993 J. Appl. Crystallogr. 26405
[4] Borowski J et al 2005 J. Alloys Compd. 401 212
[5] Metzger T et al 1998 Philos. Mag. A 77 1013
[6] Chen Z T et al 2006 J. Cryst. Growth 294 156
[7] Xu Z J et al 2007 Measurement and Analyses ofSemiconductors (Beijing: Science Press) chap 2, p 154 (in Chinese)
[8] Leszczynski M 1993 Phys. Rev. B 48 17046
[9] Gay P, Hirsch P B and Kelly A 1953 Acta Metal. 1 315
[10] Ayers J E 1994 J. Crystal Growth. 135 71
[11] Bowen D K and Tanner B K 2001 High Resolution X-rayDiffraction and Topography (London: Taylor {\& Francis) chap 3 p60
Related articles from Frontiers Journals
[1] WANG Guo-Biao, XIONG Huan, LIN You-Xi, FANG Zhi-Lai, KANG Jun-Yong, DUAN Yu, SHEN Wen-Zhong. Green Emission from a Strain-Modulated InGaN Active Layer[J]. Chin. Phys. Lett., 2012, 29(6): 076104
[2] SUN Bing, CHANG Hu-Dong, LU Li, LIU Hong-Gang, WU De-Xin. High-Quality Single Crystalline Ge(111) Growth on Si(111) Substrates by Solid Phase Epitaxy[J]. Chin. Phys. Lett., 2012, 29(3): 076104
[3] CHENG Feng-Feng , FA Tao, WANG Xin-Qiang, YAO Shu-De. Dislocation and Elastic Strain in an InN Film Characterized by Synchrotron Radiation X-Ray Diffraction and Rutherford Backscattering/Channeling[J]. Chin. Phys. Lett., 2012, 29(2): 076104
[4] SANG Ling, LIU Jian-Ming, XU Xiao-Qing, WANG Jun, ZHAO Gui-Juan, LIU Chang-Bo, GU Cheng-Yan, LIU Gui-Peng, WEI Hong-Yuan, LIU Xiang-Lin, YANG Shao-Yan, ZHU Qin-Sheng, WANG Zhan-Guo. Morphological Evolution of a-GaN on r-Sapphire by Metalorganic Chemical Vapor Deposition[J]. Chin. Phys. Lett., 2012, 29(2): 076104
[5] TENG Long, ZHANG Rong, XIE Zi-Li, TAO Tao, ZHANG Zhao, LI Ye-Cao, LIU Bin, CHEN Peng, HAN Ping, ZHENG You-Dou. Raman Scattering Study of InxGa1−xN Alloys with Low Indium Compositions[J]. Chin. Phys. Lett., 2012, 29(2): 076104
[6] SONG Shi-Wei, LIANG Hong-Wei**, LIU Yang, XIA Xiao-Chuan, SHEN Ren-Sheng, LUO Ying-Min, DU Guo-Tong,. A Study of GaN Grown on SiH4 Pre-Treated 6H-SiC Substrates[J]. Chin. Phys. Lett., 2012, 29(1): 076104
[7] SANG Ling**, WANG Jun**, SHI Kai, WEI Hong-Yuan, JIAO Chun-Mei, LIU Xiang-Lin, YANG Shao-Yan, ZHU Qin-Sheng, WANG Zhan-Guo. The Growth of Semi-Polar ZnO (10[J]. Chin. Phys. Lett., 2012, 29(1): 076104
[8] FAN Da-Wei**, WEI Shu-Yi, LIU Jing, LI Yan-Chun, XIE Hong-Sen . High Pressure X-Ray Diffraction Study of a Grossular–Andradite Solid Solution and the Bulk Modulus Variation along this Solid Solution[J]. Chin. Phys. Lett., 2011, 28(7): 076104
[9] ZHOU Yan, WANG Hai-Long**, MA Chuan-He, GONG Qian, FENG Song-Lin . Fabrication of Hinged Mirrors Using a Strain-Driven Self-Assembly Method on a GaAs Substrate[J]. Chin. Phys. Lett., 2011, 28(7): 076104
[10] DING Bin-Beng, PAN Feng, FENG Zhe-Chuan, FA Tao, CHENG Feng-Feng, YAO Shu-De** . Structural Analysis of In xGa1−xN/GaN MQWs by Different Experimental Methods[J]. Chin. Phys. Lett., 2011, 28(7): 076104
[11] PAN Jian-Hai, WANG Xin-Qiang**, CHEN Guang, LIU Shi-Tao, FENG Li, XU Fu-Jun, TANG Ning, SHEN Bo*** . Epitaxy of an Al-Droplet-Free AlN Layer with Step-Flow Features by Molecular Beam Epitaxy[J]. Chin. Phys. Lett., 2011, 28(6): 076104
[12] WU Meng, **, ZENG Yi-Ping, , WANG Jun-Xi, HU Qiang . Investigation of a GaN Nucleation Layer on a Patterned Sapphire Substrate[J]. Chin. Phys. Lett., 2011, 28(6): 076104
[13] CHEN Hai-Yang, JIANG Lan**, LI Da-Rang . Measurement of Beta Particles Induced Electron-Hole Pairs Recombination in Depletion Region of GaAs PN Junction[J]. Chin. Phys. Lett., 2011, 28(5): 076104
[14] CHEN Yao**, JIANG Yang, XU Pei-Qiang, MA Zi-Guang, WANG Xiao-Li, WANG Lu, JIA Hai-Qiang, CHEN Hong . Stress Control in GaN Grown on 6H-SiC by Metalorganic Chemical Vapor Deposition[J]. Chin. Phys. Lett., 2011, 28(4): 076104
[15] REN Guo-Zhong, LIU Yang, MA Hong-An, SU Tai-Chao, LIN Le-Jing, DENG Le, JIANG Yi-Ping, ZHENG Shi-Zhao, JIA Xiao-Peng** . Thermoelectric Properties of Te-Doped Ba0.32Co4Sb12−xTexPrepared at HPHT[J]. Chin. Phys. Lett., 2011, 28(4): 076104
Viewed
Full text


Abstract