Transparent Conductive Al-Doped ZnO/Cu Bilayer Films Grown on Polymer Substrates at Room Temperature
HUANG Ji-Jie1, WANG Yu-Ping1, LU Jian-Guo1**, GONG Li2, YE Zhi-Zhen1
1State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 2College of Materials Science and Engineering, Changsha University of Science and Technology, Changsha 410015
Transparent Conductive Al-Doped ZnO/Cu Bilayer Films Grown on Polymer Substrates at Room Temperature
HUANG Ji-Jie1, WANG Yu-Ping1, LU Jian-Guo1**, GONG Li2, YE Zhi-Zhen1
1State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 2College of Materials Science and Engineering, Changsha University of Science and Technology, Changsha 410015
摘要Al-doped ZnO (AZO)/Cu bi-layer films are deposited by dc magnetron sputtering on polycarbonate substrates at room temperature. The structural, electrical and optical properties of the films are investigated at various sputtering powers of the Cu layer. The AZO/Cu bi-layer film deposited at a moderate sputtering power of 180 W for the Cu layer displayed the highest figure of merit of 3.47×10−3 Ω-1, with a low sheet resistance of 12.38 Ω/sq, an acceptable visible transmittance of 73%, and a high near-infrared reflectance of about 50%.
Abstract：Al-doped ZnO (AZO)/Cu bi-layer films are deposited by dc magnetron sputtering on polycarbonate substrates at room temperature. The structural, electrical and optical properties of the films are investigated at various sputtering powers of the Cu layer. The AZO/Cu bi-layer film deposited at a moderate sputtering power of 180 W for the Cu layer displayed the highest figure of merit of 3.47×10−3 Ω-1, with a low sheet resistance of 12.38 Ω/sq, an acceptable visible transmittance of 73%, and a high near-infrared reflectance of about 50%.
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2011, Vol. 28 
