A Novel Model of the H Radical in Hot-Filament Chemical Vapor Deposition
GUO Xiao-Song, BAO Zhong, ZHANG Shan-Shan, XIE Er-Qing**
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Physical Science and Technology School, Lanzhou University, Lanzhou 730000
A Novel Model of the H Radical in Hot-Filament Chemical Vapor Deposition
GUO Xiao-Song, BAO Zhong, ZHANG Shan-Shan, XIE Er-Qing**
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Physical Science and Technology School, Lanzhou University, Lanzhou 730000
摘要Amorphous hydrogenated and crystalline silicon thin films were prepared by hot-filament chemical vapor deposition. A structural transformation from amorphous phase to crystalline phase by increasing the filament temperature T fil from 1600 °C to 1650 °C was observed. This phenomenon may result from the associated abundance of H radicals participating in the growth of the films. A probability distribution model of the H radical is proposed to elucidate this phenomenon. According to this model, the phase transition is due to a distinct difference in the probability distribution of the H radicals, which seems to be dependent upon Tfil.
Abstract：Amorphous hydrogenated and crystalline silicon thin films were prepared by hot-filament chemical vapor deposition. A structural transformation from amorphous phase to crystalline phase by increasing the filament temperature T fil from 1600 °C to 1650 °C was observed. This phenomenon may result from the associated abundance of H radicals participating in the growth of the films. A probability distribution model of the H radical is proposed to elucidate this phenomenon. According to this model, the phase transition is due to a distinct difference in the probability distribution of the H radicals, which seems to be dependent upon Tfil.
GUO Xiao-Song;BAO Zhong;ZHANG Shan-Shan;XIE Er-Qing**
. A Novel Model of the H Radical in Hot-Filament Chemical Vapor Deposition[J]. 中国物理快报, 2011, 28(2): 28101-028101.
GUO Xiao-Song, BAO Zhong, ZHANG Shan-Shan, XIE Er-Qing**
. A Novel Model of the H Radical in Hot-Filament Chemical Vapor Deposition. Chin. Phys. Lett., 2011, 28(2): 28101-028101.
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