摘要One-dimensional deposition of a neutral chromium atomic beam focused by a near-resonant Gaussian standing-laser field is discussed by using a fourth-order Runge-Kutta type algorithm. The deposition pattern of neutral chromium atoms in a laser standing wave with different laser power is discussed and the simulation result shows that the full width at half maximum (FWHM) of a nanometer stripe is 115nm and the contrast is 2.5:1 with laser power 3.93mW; the FWHM is 0.8nm and the contrast is 27:1 with laser power 16mW, the optimal laser power; but with laser power increasing to 50mW, the nanometer structure forms multi-crests and the quality worsens quickly with increasing laser power.
Abstract：One-dimensional deposition of a neutral chromium atomic beam focused by a near-resonant Gaussian standing-laser field is discussed by using a fourth-order Runge-Kutta type algorithm. The deposition pattern of neutral chromium atoms in a laser standing wave with different laser power is discussed and the simulation result shows that the full width at half maximum (FWHM) of a nanometer stripe is 115nm and the contrast is 2.5:1 with laser power 3.93mW; the FWHM is 0.8nm and the contrast is 27:1 with laser power 16mW, the optimal laser power; but with laser power increasing to 50mW, the nanometer structure forms multi-crests and the quality worsens quickly with increasing laser power.
ZHANG Wen-Tao;ZHU Bao-Hua. Simulation of Chromium Atom Deposition Pattern in a Gaussain Laser Standing Wave with Different Laser Power[J]. 中国物理快报, 2009, 26(7): 73201-073201.
ZHANG Wen-Tao, ZHU Bao-Hua. Simulation of Chromium Atom Deposition Pattern in a Gaussain Laser Standing Wave with Different Laser Power. Chin. Phys. Lett., 2009, 26(7): 73201-073201.
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2009, Vol. 26 
