2009, Vol. 26(7): 73201-073201    DOI: 10.1088/0256-307X/26/7/073201
Simulation of Chromium Atom Deposition Pattern in a Gaussain Laser Standing Wave with Different Laser Power
ZHANG Wen-Tao, ZHU Bao-Hua
Department of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004
收稿日期 2009-01-01  修回日期 1900-01-01
Supporting info

[1] McClelland J J, Shannon B H and Marin P 2004 Sci.
Technol. Adv. Mater. 5 575

[2] Celotta R J, Gupta R and Scholten R E 1996 J. Appl.
Phys. 79 6079

[3] William D P 1998 Rev. Mod. Phys. 70 721

[4] Lison F, Adams H J and Haubrich D 1997 Appl. Phys.
65 419

[5] Drodofsky U, Stuhler J and Brezger B 1997
Microelectron. Engin. 35 285

[6] Bell A S, Pfau T and Drodofsky U 1998 Microelectron.
Engin. 41 587

[7] Drodofsky U, Drewsen M and Pfau T 1996 Microelectron.
Engin. 30 383

[8] Mutzel M, Rasbach U and Meschede D 2003 Appl. Phys.
B 77 1

[9] Scholten R E, McClelland J J and Palm E C 1994 J.
Vac. Sci. Technol. B 12 1847

[10] Drodofsky U, Stuhler J and Brezger B 1997
Microelectron. Engin. 35 285