1State Key Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093 2WuXi China Resources Huajing Micro Electronics Co. Ltd., Wuxi 214061
Observation of Coulomb Oscillations with Single Dot Characteristics in Heavy Doped Ultra Thin SOI Nanowires
1State Key Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093 2WuXi China Resources Huajing Micro Electronics Co. Ltd., Wuxi 214061
摘要Nanowire devices with back gate are fabricated in a heavy doped ultra thin SOI layer by electron beam lithography. Regular and periodic Coulomb oscillations with single dot behavior are observed in an appropriate back gate voltage range. The oscillation period can be determined by the back gate capacitance. The role of the back gate can control the electrical characteristics from the multi-dot junction regimes to the single dot junction regimes. These Coulomb oscillations due to single-electron tunneling are not smeared out by thermal vibration energy when the temperature is less than 40 K.
Abstract:Nanowire devices with back gate are fabricated in a heavy doped ultra thin SOI layer by electron beam lithography. Regular and periodic Coulomb oscillations with single dot behavior are observed in an appropriate back gate voltage range. The oscillation period can be determined by the back gate capacitance. The role of the back gate can control the electrical characteristics from the multi-dot junction regimes to the single dot junction regimes. These Coulomb oscillations due to single-electron tunneling are not smeared out by thermal vibration energy when the temperature is less than 40 K.
FANG Zhong-Hui;ZHANG Xian-Gao;CHEN Kun-Ji;QIAN Xin-Ye;XU Jun;HUANG Xin-Fan;HE Fei. Observation of Coulomb Oscillations with Single Dot Characteristics in Heavy Doped Ultra Thin SOI Nanowires[J]. 中国物理快报, 2010, 27(5): 57304-057304.
FANG Zhong-Hui, ZHANG Xian-Gao, CHEN Kun-Ji, QIAN Xin-Ye, XU Jun, HUANG Xin-Fan, HE Fei. Observation of Coulomb Oscillations with Single Dot Characteristics in Heavy Doped Ultra Thin SOI Nanowires. Chin. Phys. Lett., 2010, 27(5): 57304-057304.
[1] Likharev K K 1999 Proc. IEEE 87 606 [2] Kitade T, Ohkura K and Nakajima A 2005 Appl. Phys. Lett. 86 123118 [3] Kobayashi M and Hiramoto 2008 J. Appl. Phys. 103 053709 [4] Takahashi Y, Ono Y, Fujiwara A, Nishiguchi K and Inokawa H 2009 Device Applications of Silicon Nanocrystals and nanostructures, edited by Koshida N (New York: Springer) chap 5 p 125 [5] Fulton T A and Dolan G J 1987 Phys. Rev. Lett. 59 109 [6] Scott-Thomas J H F, Field S B, Kastner M A, Smith H I and Antoniadis D A 1989 Phys. Rev. Lett. 62 583 [7] Cao G, Li H O, Tu T, Zhou C, Hao X J, Guo G C and Guo G P 2009 Chin. Phys. Lett. 26 097302 [8] Smith R A and Ahmed H 1997 J. Appl. Phys. 81 2699 [9] Tilke A, Blick R H, Lorenz H and Kotthaus J P 2001 J. Appl. Phys. 89 8159 [10] Moraru D, Ono Y, Inokawa H and Tabe M 2007 Phys. Rev. B 76 075332 [11] Manoharan M, Oda S and Mizuta H 2008 2008 Appl. Phys. Lett. 93 112107 [12] Evans G J, Mizut H and Ahmed H 2001 Jpn. J. Appl. Phys. 40 5837 [13] Tilke A, Simmel F C, Blick R H, Lorenz H and Kotthaus J P 2001 Prog. Quantum Electron. 25 97 [14] Augke R, Eberhardt W, Single C, Prins F E, Wharam D A and Kern D P 2000 Appl. Phys. Lett. 76 2065 [15] Ferry D K, Akis R, Bird J P, Pivin D P Jr, Holmberg N, Badrieh F and Vasileska D 1998 Second International Workshop on Physics and Modeling of Devices Based on Low-Dimensional Structures (Aizu-Wakamatsu, Japan 12--13 March 1998) p 54