中国物理快报  2007, Vol. 24 Issue (5): 1393-1396    
  Original Articles 本期目录 | 过刊浏览 | 高级检索 |
MOCVD Growth and Characterization of Epitaxial AlxGa1-x N Films
LI Liang1, ZHANG Rong1, XIE Zi-Li1, ZHANG Yu 1, 2, XIU Xiang-Qian1, LIU Bin1, CHEN Lin1, YU Hui-Qiang1, HAN Ping1, GONG Hai-Mei3, ZHENG You-Dou1
1Key Laboratory of Advanced Photonic and Electronic Materials, Department of Physics, Nanjing University, Nanjing 2100932Department of Physics, School of Applied Science, University of Science and Technology Beijing, Beijing 1000833Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083
MOCVD Growth and Characterization of Epitaxial AlxGa1-x N Films
LI Liang1;ZHANG Rong1;XIE Zi-Li1;ZHANG Yu 1;2;XIU Xiang-Qian1;LIU Bin1;CHEN Lin1;YU Hui-Qiang1;HAN Ping1;GONG Hai-Mei3;ZHENG You-Dou1
1Key Laboratory of Advanced Photonic and Electronic Materials, Department of Physics, Nanjing University, Nanjing 2100932Department of Physics, School of Applied Science, University of Science and Technology Beijing, Beijing 1000833Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083