Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium
KANG Zheng-De, PU Yi-Kang
Department of Engineering Physics, Tsinghua University, Beijing 100084
Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium
KANG Zheng-De;PU Yi-Kang
Department of Engineering Physics, Tsinghua University, Beijing 100084
关键词 ：
52.20.Fs ,
52.25.Jm ,
52.70.Kz
Abstract ： A new technique, adding argon or helium into nitrogen plasma, has been used to regulate the electron temperature in an inductively coupled plasma. The electron temperature is determined by analysing the intensity ratio of two nitrogen spectrum lines. The results show that, when the total pressure is 0.7 Pa, the electron temperature increases with the increase of the He partial pressure in He/N2 plasma, but the electron temperature decreases with the increase of the Ar partial pressure in Ar/N2 plasma. The regulation effect of electron temperature is weaker in higher pressure N2 /He plasma of 2.6 Pa.
Key words ：
52.20.Fs
52.25.Jm
52.70.Kz
出版日期: 2002-08-01
:
52.20.Fs
(Electron collisions)
52.25.Jm
(Ionization of plasmas)
52.70.Kz
(Optical (ultraviolet, visible, infrared) measurements)
引用本文:
KANG Zheng-De;PU Yi-Kang. Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium[J]. 中国物理快报, 2002, 19(8): 1139-1140.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2002/V19/I8/1139
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2002, Vol. 19 
