| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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A Computational Study of Radio Frequency Atmospheric Pressure Discharge in Nitrogen and Oxygen Mixture Gases |
| WANG Yi-Nan, LIU Yue**, LIN Guo-Qiang |
Key Laboratory of Materials Modification by Laser, Electron, and Ion Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024
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WANG Yi-Nan, LIU Yue, LIN Guo-Qiang 2013 Chin. Phys. Lett. 30 035201 |
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Abstract The characteristics of radio frequency atmospheric pressure discharge in nitrogen and oxygen mixture gases are investigated by using a one-dimensional fluid model. The model consists of equations of particle continuity, Poisson's equation, and the electron energy equation. The effect of the concentrations of O2 in N2 on the discharge characteristics is analyzed. The results show that when the concentration of O2 in N2 is less than 12%, as the amount of O2 grows, the electron density and the N4+ ion density decrease; the main negative particles are electrons. When the concentration of O2 in N2 is greater than 12%, the electron density and the N4+ ion density increase with the increasing admixture of oxygen; the main negative particle is the O? ion. Moreover, the O? ion density, the O2+ ion density, the electron temperature and the mixture gases electronegativity increase with growth of O2 in the range from 4% to 20% and with density of O2 in N2.
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Received: 19 June 2012
Published: 29 March 2013
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[1] David S, Bakhtier F, Alexander G and Alexander F 2008 Plasma Sources Sci. Technol. 17 025013
[2] Wang Y H and Wang D Z 2006 Acta Phys. Sin. 55 5923 (in Chinese)
[3] Wang Y H and Wang D Z 2005 Acta Phys. Sin. 54 1295 (in Chinese)
[4] Shi J J and Kong M G 2005 J. Appl. Phys. 97 023306
[5] Wang Y H and Wang D Z 2004 Chin. Phys. Lett. 21 2234
[6] Fang T Z, Ouyang J M and Wang L 2005 Chin. Phys. Lett. 22 2888
[7] Fang T, Dong L F and Yin Z Q 2011 Acta Phys. Sin. 60 025206 (in Chinese)
[8] Wang L, Shao F Q and Guo W 2004 Chin. Phys. B 13 2174
[9] Balcon N, Hagelaar G J M and Boeuf J P 2008 IEEE Trans. Plasma Sci. 36 2782
[10] Brandenburg R, Maiorov V A, Golubovski Y B, Behnke J and Behnke J F 2005 J. Phys. D: Appl. Phys. 38 2187
[11] Chung T H, Yoon H J and Seo D C 1999 J. Appl. Phys. 86 3536
[12] Hagelaar G J M and Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[13] Dimitris P L and Demetre J E 1993 J. Appl. Phys. 73 3668
[14] Wang Y N, Cui S Y, Zheng S, Nian S H, Lin G Q and Liu Y 2011 Front. Appl. Plasma Technol. 4 59
[15] Wang Y N, Liu Y, Zheng S and Lin G Q 2012 Chin. Phys. B 21 075202
[16] You Z W 2009 Master Thesis (Dalian: Dalian University of Technology) (in Chinese)
[17] Golubovskii Y B, Maiorov V A, Behnke J et al 2002 J. Phys. D: Appl. Phys. 35 751
[18] Panousis E, Papageorghiou L, Spyrou N, Loiseau J F et al 2007 J. Phys. D: Appl. Phys. 40 4168
[19] Golubovskii Y B, Maiorov V A, Behnke J F et al 2004 J. Phys. D: Appl. Phys. 37 1346
[20] Guerra V and Loureio J 1997 Plasma Sources Sci. Technol. 6 373 |
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