| CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Ultrathin Carbon Films Prepared by Negative Cluster-Beam Technology |
| ZHANG Zao-Di, WANG Ze-Song, WANG Shi-Xu, FU De-Jun** |
| Accelerator Laboratory, School of Physics and Technology and Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education of China, Wuhan University, Wuhan 430072 |
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| Cite this article: |
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ZHANG Zao-Di, WANG Ze-Song, WANG Shi-Xu et al 2012 Chin. Phys. Lett. 29 078101 |
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Abstract We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported. Negative clusters C1−− C10− are obtained with beam currents of 1–104 nA at energies of 10–20 keV. C2− beams of 0.2 µA are used to directly deposit carbon films on SiO2/Si substrates. Formation of ultrathin carbon films are demonstrated by Raman scattering, which reveals the evolution of the graphitic peak (1550 cm−2) with deposition time.
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Received: 09 February 2012
Published: 29 July 2012
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| PACS: |
81.05.-t
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(Specific materials: fabrication, treatment, testing, and analysis)
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29.25.Ni
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(Ion sources: positive and negative)
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