CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
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Can Hydrogen be Incorporated inside Silicon Nanocrystals? |
NI Zhen-Yi, PI Xiao-Dong**, YANG De-Ren |
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 |
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Cite this article: |
NI Zhen-Yi, PI Xiao-Dong, YANG De-Ren 2012 Chin. Phys. Lett. 29 077801 |
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Abstract Hydrogen is omnipresent during the synthesis and processing of silicon nanocrystals (Si NCs). It is generally assumed that the incorporation of hydrogen leads to the passivation of Si dangling bonds at the NC surface. However, it is also speculated that hydrogen may be incorporated inside Si NCs. In this work the formation energy and probability of hydrogen in its three configurations, i.e., hydrogen molecules, bond-centered atomic hydrogen, and antibonding atomic hydrogen, are calculated to rigorously evaluate the incorporation of hydrogen inside Si NCs. We find that hydrogen cannot be incorporated inside Si NCs with a diameter of a few nanometers at temperatures up to 1500 K.
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Received: 22 December 2011
Published: 29 July 2012
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PACS: |
78.40.Fy
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(Semiconductors)
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73.21.La
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(Quantum dots)
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73.20.Hb
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(Impurity and defect levels; energy states of adsorbed species)
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[1] Van de Walle C G and Neugebauer J 2006 Annu. Rev. Mater. Res. 36 179 [2] Pearton S J, Corbett J W and Shi T S 1987 Appl. Phys. A 43 153 [3] Mangolini L, Thimsen E and Kortshagen U 2005 Nano Lett. 5 655 [4] Li X G, He Y Q, Talukdar S S and Swihart M T 2003 Langmuir 19 8490 [5] Ostraat M L, De Blauwe J W, Green M L, Bell L D, Atwater H A and Flagan R C 2001 J. Electrochem. Soc. 148 G265 [6] Ehbrecht M, Kohn B, Huisken F, Laguna M A and Paillard V 1997 Phys. Rev. B 56 6958 [7] Comedi D, Zalloum O H Y, Wojcik J and Mascher P 2006 IEEE J. Sel. Top. Quantum Electron. 12 1561 [8] Pi X D, Zalloum O H Y, Roschuk T, Wojcik J, Knights A P, Mascher P and Simpson P J 2006 Appl. Phys. Lett. 88 103111 [9] Wolkin M V, Jorne J, Fauchet P M, Allan G and Delerue C 1999 Phys. Rev. Lett. 82 197 [10] Yu D K, Zhang R Q and Lee S T 2002 J. Appl. Phys. 92 7453 [11] Chen X B, Pi X D and Yang D R 2010 J. Phys. Chem. C 114 8774 [12] Puzder A, Williamson A J, Reboredo F A and Galli G 2003 Phys. Rev. Lett. 91 157405 [13] Pi X D, Mangolini L, Campbell S A and Kortshagen U 2007 Phys. Rev. B 75 085423 [14] Mangolini L and Kortshagen U 2007 Adv. Mater. 19 2513 [15] Ma J, We S H, Neale N R and Nozik A J 2011 Appl. Phys. Lett. 98 173103 [16] Van de Walle C G 1994 Phys. Rev. B 49 4579 [17] Deák P, Snyder L C and Corbett J W 1988 Phys. Rev. B 37 6887 [18] Niesar S, Stegner A R, Pereira R N, Hoeb M, Wiggers H, Brandt M S and Stutzmann M 2010 Appl. Phys. Lett. 96 193112 [19] Neiner D and Kauzlarich S M 2010 Chem. Mater. 22 487 [20] Pi X D, Chen X B and Yang D R 2011 J. Phys. Chem. C 115 9838 [21] Ma Y S, Chen X B, Pi X D and Yang D R 2011 J. Phys. Chem. C 115 12822 [22] Carroll M S, Brewer L, Verley J C, Banks J, Sheng J J, Pan W and Dunn R 2007 Nanotechnology 18 315707 |
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