| FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array |
LIANG Hui-Min1, WANG Jing-Quan2, FAN Feng1, QIN Ai-Li1, ZHANG Chun-Yuan1, CHENG Hui1 |
| 1College of Science, Hebei University of Engineering, Handan 056038 2College of Physical Science and Technology, Sichuan University, Chengdu 610064 |
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| Cite this article: |
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LIANG Hui-Min, WANG Jing-Quan, FAN Feng et al 2010 Chin. Phys. Lett. 27 094205 |
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Abstract A practical interference lithography scheme based on surface plasmon polaritions (SPPs) is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave (EW) carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated on a resist, the energy of EW will launch strong SPPs and form enhanced interference nanopatterns in the resist. The simulation results confirm that a high quality nanopattern with a critical dimension of λ/7 can be achieved in the resistance. The analysis results indicate that the height of the cylinder lenses can provide a large tolerance to decrease the fabrication difficulty of this element.
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| Keywords:
42.79.-e
42.25.Hz
52.35.Hr
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Received: 19 April 2010
Published: 25 August 2010
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| PACS: |
42.79.-e
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(Optical elements, devices, and systems)
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42.25.Hz
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(Interference)
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52.35.Hr
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(Electromagnetic waves (e.g., electron-cyclotron, Whistler, Bernstein, upper hybrid, lower hybrid))
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