Chin. Phys. Lett.  2010, Vol. 27 Issue (5): 052902    DOI: 10.1088/0256-307X/27/5/052902
NUCLEAR PHYSICS |
Optimization of Experimental Discharge Parameters to Increase the Arc Efficiency of the Bucket Ion Source
YU Li-Ming, LEI Guang-Jiu, CAO Jian-Yong, ZHONG Guang-Wu, JIANG Shao-Feng, ZOU Gui-Qing, JIANG Tao, LU Da-Lun, ZHANG Xian-Ming, LIU He
Southwestern Institute of Physics, Chengdu 610041
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YU Li-Ming, LEI Guang-Jiu, CAO Jian-Yong et al  2010 Chin. Phys. Lett. 27 052902
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Abstract Arc efficiency is a critical criterion for assessing the performance of the ion source. High arc efficiency is necessary for a high power ion source, because it can decrease the load of the arc power supply. Thus the relationship between the discharge parameters (gas pressure, arc voltage, filament current, bias resistance connecting between the anode and plasma grid) and the arc efficiency is investigated in experiment especially. It is found that with increasing pressure, the arc efficiency increases fast if the pressure is below 0.4 Pa, but when it is above 0.4 Pa, the arc efficiency remains unchanged or increases slowly. If we increase the arc voltage or filament current, the arc efficiency decreases. The bias resistance also influences the arc efficiency, at the same pressure the arc efficiency increases with resistance.
Keywords: 29.27.Fh      29.27.Ac      29.25.Ni     
Received: 12 November 2009      Published: 23 April 2010
PACS:  29.27.Fh (Beam characteristics)  
  29.27.Ac (Beam injection and extraction)  
  29.25.Ni (Ion sources: positive and negative)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/27/5/052902       OR      https://cpl.iphy.ac.cn/Y2010/V27/I5/052902
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Articles by authors
YU Li-Ming
LEI Guang-Jiu
CAO Jian-Yong
ZHONG Guang-Wu
JIANG Shao-Feng
ZOU Gui-Qing
JIANG Tao
LU Da-Lun
ZHANG Xian-Ming
LIU He
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[4] Zou G Q, Lei G J, Jiang S F et al 2009 Chin. Phys. Lett. 26 082901
[5] Yu L M, Lei G J, Cao J Y et al 2010 Chin. Phys. Lett. 27 042901
[6] Sakuraba J, Akiba M, Arakawa Y et al 1982 Jpn. J. Appl. Phys. 21 325
[7] Stirling W L, Ryan P M, Tsai C C et al 1979 Rev. Sci. Instrum. 50 102
[8] Xiang Z L and Yu C X 1982 Diagnostics Technology on High Temperature Plasma (Shanghai: Shanghai Science and Technology Publishing House) p 27
[9] Mishra M K and Phukan A 2008 Chin. Phys. Lett. 25 1011
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