Chin. Phys. Lett.  2003, Vol. 20 Issue (6): 942-943    DOI:
Original Articles |
Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering
MA De-Wei1;YE Zhi-Zhen1;HUANG Jing-Yun1;ZHAO Bing-Hui1;WAN Shou-Ke2;SUN Xue-Hao2;WANG Zhan-Guo2
1State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027 2Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
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MA De-Wei, YE Zhi-Zhen, HUANG Jing-Yun et al  2003 Chin. Phys. Lett. 20 942-943
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Abstract Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x ≤ 0.6. For x = 0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO (x = 0.2) thin film has a red-shift of 0.14 eV from that of ZnO reported previously.
Keywords: 78.66.Hf      78.55.-m      61.10.Kw      81.15.Cd     
Published: 01 June 2003
PACS:  78.66.Hf (II-VI semiconductors)  
  78.55.-m (Photoluminescence, properties and materials)  
  61.10.Kw  
  81.15.Cd (Deposition by sputtering)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2003/V20/I6/0942
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MA De-Wei
YE Zhi-Zhen
HUANG Jing-Yun
ZHAO Bing-Hui
WAN Shou-Ke
SUN Xue-Hao
WANG Zhan-Guo
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