CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Illumination and Voltage Dependence of Electrical Characteristics of Au/0.03 Graphene-Doped PVA/n-Si Structures via Capacitance/Conductance–Voltage Measurements |
SAHAR Alialy1, AHMET Kaya2**, İ Uslu3, ŞEMSETTIN Altındal1 |
1Physics Department, Faculty of Sciences, Gazi University, Ankara 06500, Turkey 2Opticianry Department, Vocat Sch Med Sci, Turkey Turgut ?zal University, Ankara 78050, Turkey 3Department of Chemistry Education, Faculty of Education, Gazi University, Ankara 06500, Turkey
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Cite this article: |
SAHAR Alialy, AHMET Kaya, ? Uslu et al 2015 Chin. Phys. Lett. 32 116102 |
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Abstract Au/n-Si (MS) structures with a high dielectric interlayer (0.03 graphene-doped PVA) are fabricated to investigate the illumination and voltage effects on electrical and dielectric properties by using capacitance–voltage (C–V) and conductance–voltage (G/ω–V) measurements at room temperature and at 1 MHz. Some of the main electrical parameters such as concentration of doping atoms (ND), barrier height (?B(C?V)), depletion layer width (WD) and series resistance (Rs) show fairly large illumination dispersion. The voltage-dependent profile of surface states (Nss) and resistance of the structure (Ri) are also obtained by using the dark-illumination capacitance (Cdark–Cill) and Nicollian–Brews methods, respectively. For a clear observation of changes in electrical parameters with illumination, the values of ND, WD, ?B(C?V) and Rs are drawn as a function of illumination intensity. The values of ND and WD change almost linearly with illumination intensity. On the other hand, Rs decreases almost exponentially with increasing illumination intensity whereas ?B(C?V) increases. The experimental results suggest that the use of a high dielectric interlayer (0.03 graphene-doped PVA) considerably passivates or reduces the magnitude of the surface states. The large change or dispersion in main electrical parameters can be attributed to generation of electron-hole pairs in the junction under illumination and to a good light absorption. All of these experimental results confirm that the fabricated Au/0.03 graphene-doped PVA/n-Si structure can be used as a photodiode or a capacitor in optoelectronic applications.
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Received: 01 June 2015
Published: 01 December 2015
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PACS: |
61.72.uj
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(III-V and II-VI semiconductors)
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61.25.he
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(Polymer solutions)
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82.45.Jn
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(Surface structure, reactivity and catalysis)
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[1] Duman S, ?z?elik F S, Gurbulak B, Korucu D, Bariş O and Turgut G 2014 Mater. Sci. Semicond. Process. 28 20 [2] K?l?co?lu T, Tombak A, Ocak Y S and Aydemir M 2014 Microelectron. Eng. 129 91 [3] Li Z J, Li Q, Cheng Z G, Li H B and Fang Y 2014 Chin. Phys. B 23 028102 [4] Yucedag I, Kaya A, Altindal S and Uslu I 2014 Chin. Phys. B 23 047304 [5] Kaya A, Zeyrek S, San S E and Alt?ndal S 2014 Chin. Phys. B 23 18506 [6] Karataş Ş and Yakuphano?lu F 2013 Mater. Chem. Phys. 138 72 [7] Uslu H, Alt?ndal Ş and D?kme ? 2010 J. Appl. Phys. 108 104501 [8] Alialy S, Tecimer H, Uslu H and Alt?ndal Ş 2013 J. Nanomed. Nanotechnol. 3 1 [9] Alialy S, Alt?ndal Ş Tanr?kulu E E and Y ?ld?z D E 2014 J. Appl. Phys. 116 083709 [10] Parui S, Ruiter R, Zomer P J, Wojtaszek M, Van Wees B J and Banerjee T 2014 J. Appl. Phys. 116 244505 [11] Shehap A, Abd Allah R A, Basha A F and Abd El-Kader F H 1998 J. Appl. Polym. Sci. 68 687 [12] D?kme ?, Alt?ndal Ş Tun? T and Uslu I 2010 Microelectron. Reliab. 50 39 [13] Stoller M D, Park S, Zhu Y, An J and Ruoff R S 2008 Nano Lett. 8 3498 [14] Nicollian E H and Brews J R 1982 MOS Physics and Technology (New York: John Wiley & Sons) [15] Hokque M M, Dutta A, Kumar S and Sinha T P 2014 J. Mater. Sci. Technol. 30 311 [16] A Laha and S B Kurupanidhi 2003 Mater. Sci. Eng. B 98 204 [17] Tombak A, Ocak Y S, Asubay S, K?l?co?lu T and ?zkahraman F 2014 Mater. Sci. Semicond. Process. 24 187 [18] ?etinkaya H G, Alialy S, Alt?ndal Ş Kaya A and Uslu I 2015 J. Mater. Sci.: Mater. Electron. 26 3186 [19] Sharma B L 1984 Metal-Semiconductor Schottky Barrier Junctions and Their Applications (New York: Plenum Press) [20] Rhoderick E H and Williams R H 1988 Metal Semiconductor Contacts (Oxford: Oxford Press) [21] Sze S M and Kwok K N 2007 Physics of Semiconductor Devices (New Jersey: John Wiley & Sons) [22] Bilkan ? Zeyrek S, San S E and Altindal Ş 2015 Mater. Sci. Semicond. Process. 32 137 [23] Demirezen S, Kaya A, Vural ? and Alt?ndal Ş 2015 Mater. Sci. Semicond. Process. 33 140 [24] G?k?en M, Tun? T, Alt?ndal Ş and Uslu ? 2012 Curr. Appl. Phys. 12 525 [25] G?k?en M, Alt?ndal Ş Karaman M and Aydemir U 2011 Physica B 406 4119 [26] Lin Y j, Zeng J J and Chang H C 2015 Appl. Phys. A 118 353 [27] ?etinkaya H G, Alialy S, Alt?ndal Ş Kaya A and Uslu I 2015 J. Mater. Sci.: Mater. Electron. 26 3186 |
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