| CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
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Fabrication of Through Micro-hole Arrays in Silicon Using Femtosecond Laser Irradiation and Selective Chemical Etching |
| GAO Bo, CHEN Tao**, CHEN Ying, SI Jin-Hai, HOU Xun |
Key Laboratory for Physical Electronics and Devices of the Ministry of Education & Shaanxi Key Lab of Information Photonic Technique, School of Electronics & information Engineering, Xi'an Jiaotong University, Xi'an 710049
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| Cite this article: |
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GAO Bo, CHEN Tao, CHEN Ying et al 2015 Chin. Phys. Lett. 32 107901 |
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Abstract We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching. The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofluoric acid solution. The morphologies of the through micro-holes and micro-hole arrays are characterized by using scanning electronic microscopy. The effects of the pulse number on the depth and diameter of the holes are investigated. Honeycomb arrays of through micro-holes fabricated at different laser powers and pulse numbers are demonstrated.
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Received: 24 May 2015
Published: 30 October 2015
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| PACS: |
79.20.Eb
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(Laser ablation)
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79.20.Ws
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(Multiphoton absorption)
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82.30.-b
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(Specific chemical reactions; reaction mechanisms)
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