Chin. Phys. Lett.  2015, Vol. 32 Issue (08): 088301    DOI: 10.1088/0256-307X/32/8/088301
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Effect of Abrasive Concentration on Chemical Mechanical Polishing of Sapphire
YAN Wei-Xia1,2, ZHANG Ze-Fang1, GUO Xiao-Hui1, LIU Wei-Li1**, SONG Zhi-Tang1
1State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Shanghai 200050
2University of Chinese Academy of Sciences, Beijing 100049
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YAN Wei-Xia, ZHANG Ze-Fang, GUO Xiao-Hui et al  2015 Chin. Phys. Lett. 32 088301
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Abstract Effects of abrasive concentration on material removal rate (MRR) and surface quality in the chemical mechanical polishing (CMP) of light-emitting diode sapphire substrates are investigated. Experimental results show that the MRR increases linearly with the abrasive concentration, while the rms roughness decreases with the increasing abrasive concentration. In addition, the in situ coefficient of friction (COF) is also conducted during the sapphire polishing process. The results present that COF increases sharply with the abrasive concentration up to 20 wt% and then shows a slight decrease from 20 wt% to 40 wt%. Temperature is a product of the friction force that is proportional to COF, which is an indicator for the mechanism of the sapphire CMP.
Received: 22 December 2014      Published: 02 September 2015
PACS:  83.50.Jf (Extensional flow and combined shear and extension)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/32/8/088301       OR      https://cpl.iphy.ac.cn/Y2015/V32/I08/088301
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YAN Wei-Xia
ZHANG Ze-Fang
GUO Xiao-Hui
LIU Wei-Li
SONG Zhi-Tang
[1] Smith M, Schmid K, Schmid F and Khattak C P 1999 Proc. SPIE 3705 85
[2] Liu Y Y, Zhu J, Luo W B, Hao L Z, Zhang Y and Li Y R 2011 Chin. Phys. B 20 108102
[3] Zhu H L, Tessaroto L A, Sabia R, Greenhut V A, Smith M and Niesz D E 2004 Appl. Surf. Sci. 236 120
[4] Zhu H L, Niesz D E, Greenhut V A and Sabia R 2005 J. Mater. Res. 20 504
[5] Yan W X, Zhang Z F, Guo X H, Liu W L and Song Z T 2015 ECS J. Solid State Sci. Technol. 4 P108
[6] Liu Y, Tan B, Zhou J, Niu X, Wang S, Kang J and Zhang W 2007 20070278447
[7] Zhang Z, Yan W, Zhang L, Liu W and Song Z 2011 Microelectron. Eng. 88 3020
[8] Zhang Z, Liu W, Song Z and Hu X 2010 J. Electrochem. Soc. 157 H688
[9] Cook L M 1990 J. Non-Cryst. Solids 120 152
[10] Homma Y, Fukushima K, Kondo S and Sakum N 2003 J. Electrochem. Soc. 150 G751
[11] Philipossian A and Mitchell E 2003 J. Electrochem. Soc. 150 G854
[12] Tamboli D, Banerjee G and Waddell M 2004 Electrochem. Solid-State Lett. 7 F62
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