| FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Diffraction Properties for 1000 Line/mm Free-Standing Quantum-Dot-Array Diffraction Grating Fabricated by Focused Ion Beam |
| ZHANG Ji-Cheng1, LIU Yu-Wei1, HUANG Cheng-Long1,2, ZHANG Qiang-Qiang1, YI Yong2, ZENG Yong1, ZHU Xiao-Li3, FAN Quan-Ping1, QIAN Feng1, WEI Lai1, WANG Hong-Bin1, WU Wei-Dong1**, CAO Lei-Feng1** |
1Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900
2School of Materials Science and Engineering, Southwest University of Science and Technology, Mianyang 621010
3Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029
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ZHANG Ji-Cheng, LIU Yu-Wei, HUANG Cheng-Long et al 2014 Chin. Phys. Lett. 31 124204 |
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Abstract The traditional fabrication technique of quantum-dot-array diffraction grating (QDADG) is a hybrid lithography method that includes electron-beam lithography and x-ray lithography. In this work, 1000 line/mm free-standing QDADG has successfully been fabricated by focused ion beams (FIBs) for the first time. The diffraction patterns of the grating are measured in the 250–450 nm wavelength range from the xenon lamp source. In consequence, the QDADG in this experiment can be used to disperse light without high-order diffraction. The present inspiriting result demonstrates the prospect of FIB fabrication for high energy QDADG in the soft x-ray region.
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Published: 12 January 2015
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