FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Silicon-Based Asymmetric Add-Drop Microring Resonators with Ultra-Large Through-Port Extinctions |
XIAO Xi, LI Yun-Tao, YU Yu-De, YU Jin-Zhong |
National Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 |
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Cite this article: |
XIAO Xi, LI Yun-Tao, YU Yu-De et al 2010 Chin. Phys. Lett. 27 054208 |
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Abstract We theoretically simulate and experimentally demonstrate ultra-large through-port extinctions in silicon-based asymmetrically-coupled add-drop microring resonators (MRs). Through-port responses in an add-drop MR are analyzed by simulations and large extinctions are found when the MR is near-critically coupled. Accurate fabrication techniques are applied in producing a series of 20 μm-radii add-drop microrings with drop-side gap-widths in slight differences. A through-port extinction of about 42.7 dB is measured in an MR with through- and drop-side gap-width to be respectively 280 nm and 295 nm. The large extinction suggests about a 20.5 dB improvement from the symmetrical add-drop MR of the same size and the through-side gap-width. The experimental results are finally compared with the post-fabrication simulations, which show a gap-width tolerance of >30 nm for the through-port extinction enhancement.
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Keywords:
42.82.-m
42.79.Ci
42.60.Da
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Received: 11 January 2010
Published: 23 April 2010
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PACS: |
42.82.-m
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(Integrated optics)
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42.79.Ci
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(Filters, zone plates, and polarizers)
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42.60.Da
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(Resonators, cavities, amplifiers, arrays, and rings)
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[1] Poon A W, Luo X, Xu F and Chen H 2009 Proc. IEEE 97 1216 [2] Xu Q, Fattal D and Beausoleil R G 2008 Opt. Express 16 4309 [3] Xiao S, Khan M H, Shen H and Qi M 2007 Opt. Express 15 14467 [4] Popovic M A, Watts M R, Barwicz T, Rakich P T, Socci L, Ippen E P, Kartner F X and Smith H I 2005 Optical Fiber Comm. Conf. on CD-ROM (Optical Society of America, Washington, DC, 2005) OFK1 [5] Xiao S, Khan M H, Shen H and Qi M 2007 Opt. Express 15 14765 [6] Barwicz T, Popovic M A, Watts M R, Rakich P T, Ippen E P and Smith H I 2006 J. Lightw. Technol. 24 2207 [7] Chu S T, Little B E, Pan W, Kaneko T and Kokobun Y 1999 IEEE Photon. Technol. Lett. 11 1423 [8] Vorckel A, Monster M, Henschel W, Bolivar P H and Kurz H 2003 IEEE Photon. Technol. Lett. 15 921 [9] Xu D X, Densmore A, Delage A, Waldron P, McKinnon R, Janz S, Lapointe J, Lopinski G, Mischki T, Post E, Cheben P and Schmid J H 2008 Opt. Express 16 15137 [10] Li X, Zhang Z, Qin S, Wang T, Liu F, Qiu M and Su Y 2009 Appl. Opt. 48 90 [11] Zhou L, Chen H and Poon A W 2008 J. Lightwave Technol. 26 1950 [12] Liu F, Wang T, Li Q, Ye T, Zhang Z, Qiu M and Su Y 2008 Opt. Express 16 15880 [13] Li Q, Ye T, Lu Y, Zhang Z, Qiu M and Su Y 2009 Chin. Opt. Lett. 7 12 [14] Popovic M A, Barwicz T, Gan F, Dahlem M S, Holzwarth C W, Rakich P T, Smith H I, Ippen E P and Kartner F X 2007 Conference on Lasers and Electro-Optics (CLEO) (Baltimore, MD) CPDA2 [15] Popovic M A, Barwicz T, Watts M R, Rakich P T, Socci L, Ippen E P, Kartner F X and Smith H I 2006 Opt. Lett. 31 2571 [16] Yariv A 2002 IEEE Photon. Technol. Lett. 14 483 [17] Xiao S, Khan M H, Shen H and Qi M 2007 Opt. Express 15 10553 [18] Holzwarth C W, Barwicz T and Smith H I 2007 51 st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication} |
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