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Effects of Annealing on Microstructure and Optical Properties of TiO2 Sculptured Thin Films |
| XIAO Xiu-Di1,2;DONG Guo-Ping1,2;QI Hong-Ji1,3;FAN Zheng-Xiu1;HE Hong-Bo1;SHAO Jian-Da1 |
| 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, PO BOX 800-211, Shanghai 2018002Graduate School of the Chinese Academy of Science, Beijing 1000493Shanghai Daheng of Optics and Fine Mechanics Co., Ltd, Shanghai 201800 |
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XIAO Xiu-Di, DONG Guo-Ping, QI Hong-Ji et al 2008 Chin. Phys. Lett. 25 2181-2184 |
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Abstract The evolution of microstructure and optical properties of TiO2 sculptured thin films under thermal annealing is reported. XRD, field emission SEM, UV-Vis-NIR spectra are employed to characterize the microstructural and optical properties. It is found that the optimum annealing temperature for linear birefringence is 500°C. The maximum of transmission difference for linear birefringence is up to 18%, which is more than twice of that in as-deposited thin films. In addition, the sample annealed at 500°C has a minimum of column angle about 12°C. The competitive process between the microstructural and optical properties is discussed in detail. Post-annealing is a useful method to improve the linear birefringence in sculptured thin films for practical applications.
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| Keywords:
68.37.Hk
81.07.Be
81.40.Ef
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Received: 07 March 2008
Published: 31 May 2008
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| PACS: |
68.37.Hk
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(Scanning electron microscopy (SEM) (including EBIC))
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81.07.Be
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81.40.Ef
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(Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization)
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