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Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength |
| KONG Wei-Jin1;YUN Mao-Jin1;LIU Shi-Jie2;JIN Yun-Xia2;FAN Zheng-Xiu2;SHAO Jian-Da2 |
| 1College of Physics Science, Qingdao University, Qingdao 2660712Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 |
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| Cite this article: |
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KONG Wei-Jin, YUN Mao-Jin, LIU Shi-Jie et al 2008 Chin. Phys. Lett. 25 1684-1686 |
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Abstract We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 800nm. The optimized grating can achieve >95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 770nm to 830nm, with peak diffraction efficiency of >99.5% at 800nm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents
potential high laser resistance ability. Because of its high-efficiency, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti:sapphire laser systems.
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| Keywords:
42.40.Eq
42.40.Lx
78.20.-e
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Received: 18 January 2008
Published: 29 April 2008
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| PACS: |
42.40.Eq
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(Holographic optical elements; holographic gratings)
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42.40.Lx
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(Diffraction efficiency, resolution, and other hologram characteristics)
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78.20.-e
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(Optical properties of bulk materials and thin films)
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