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Neutron Irradiation Effect in Two-Dimensional Electron Gas of AlGaN/GaN Heterostructures |
ZHANG Ming-Lan;WANG Xiao-Liang;XIAO Hong-Ling;WANG Cui-Mei;RAN Jun-Xue;HU Guo-Xin |
Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 |
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Cite this article: |
ZHANG Ming-Lan, WANG Xiao-Liang, XIAO Hong-Ling et al 2008 Chin. Phys. Lett. 25 1045-1048 |
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Abstract AlGaN/GaN heterostructures have been irradiated by neutrons with different fluences and characterized by means of temperature-dependent Hall measurements and Micro-Raman scattering techniques. It is found that the carrier mobility of two-dimensional electron gas (2DEG) is very sensitive to neutrons. At a low fluence of 6.13×1015cm-2, the carrier mobility drops sharply, while the sheet carrier density remains the same as that of an unirradiated sample. Moreover, even for a fluence of up to 3.66×1016cm-2, the sheet carrier density shows only a slight drop. We attribute the degradation of the figure-of-merit (product of ns×μ ) of 2DEG to the defects induced by neutron irradiation. Raman measurements show that neutron irradiation does not yield obvious change to the strain state of AlGaN/GaN heterostructures, which proves that degradation of sheet carrier density has no relation to strain relaxation in the present study. The increase of the product of ns×μ of 2DEG during rapid thermal annealing processes at relatively high temperature has been attributed to the activation of GeGa transmuted from Ga and the recovery of displaced defects.
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Keywords:
61.82.Fk
61.80.-x
73.40.Kp
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Received: 01 January 1900
Published: 27 February 2008
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PACS: |
61.82.Fk
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(Semiconductors)
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61.80.-x
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(Physical radiation effects, radiation damage)
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73.40.Kp
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(III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)
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[1]Khan M A, Bhattarai A, Kuznia J N and Olson D T 1993 Appl. Phys. Lett. 63 1214 [2] Wang X L, Cheng T S, Ma Z Y, Hu G X, Xiao H L, Ran J X,Wang C M and Luo W J 2007 Solid State Electron. 51 428 [3] Cai S J, Tang Y S, Li R, Wei Y Y, Wong L, Chen Y L, Wang KL, Chen M, Zhao Y F, Schrimpf R D, Keay J C and Galloway K F 2000 IEEE Trans. Electron Devices 47 304 [4] Gaudreau F, Fournier P, Carlone C, Khanna Shyam M, Tang HP, Webb J and Houdayer A 2002 IEEE Trans. Nucl. Sci. 492702 [5] Sonia G, Brunner F, Denker A, Lossy R, Mai M,Opitz-Coutuieau J, Pensl G, Richter E, Schmidt J, Zeimer U, Wang L,Weyers M, Wurfl J and Trankle G 2006 IEEE Trans. Nucl. Sci. 53 3661 [6] Polyakov A Y, Smirnov N B, Govokov A V, Markov A V,Pearton S J, Kolin N G, Merkurisov D I and Boiko V M 2005 J.Appl. Phys. 98 033529 [7] Umana-Membreno G A, Dell J M, Parish G, Nener B D, FaraoneL, Ventury R and Mishra U K 2005 Phys. Status Solidi C 22581 [8] L Hsu and W Walukiewicz 2001 J. Appl. Phys. 89 1783 [9] Kuriyama K, Tokumasu T, Takahashi Jun, Kondo H, and OkadaM 2002 Appl. Phys. Lett. 80 3328 [10] Polyakov A Y, Smirnov N B, Govorkov A V, Pashkova N V,Pearton S J, Zavada J M, and Wilson R G 2003 J. Vac. Sci.Technol. B 21 2500 [11] Polyakov A Y, Smirnov N B, Govorkov A V, Markov A V,Pearton S J, Kolin N G., Merkurisov K I, Boiko V M, Lee Cheul-Ro,and Lee Ln-Hwan 2007 J. Vac. Sci. Technol. B 25 436 |
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