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An All-Thin-Film Electrochromic Device Composed of MoO3--LiBSO--NiOx Multilayer Structure |
YANG Hai-Gang;WANG Cong;ZHU Kai-Gui;DIAO Xun-Gang;WANG Huai-Yi;CUIYi;WANG Tian-Min |
Center for Condensed Matter and Materials Physics, School of Science, Beihang University, Beijing 100083 |
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Cite this article: |
YANG Hai-Gang, WANG Cong, ZHU Kai-Gui et al 2008 Chin. Phys. Lett. 25 740-742 |
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Abstract An all-thin-film (ATF) electrochromic device for modulating the optical transmittance is manufactured using magnetron sputtering. The devices consists of MoO3 as the main electrochromic layer, LiBO2+Li2SO4(LiBSO) as the ion conductor layer, and NiOx as the complementary electrochromic layer. Glass covered with indium tin oxide (ITO) is used as the substrate and the ITO film is used as the bottom electrode. The ITO film deposited on the top of the devices is used as the other electrode. The structure and morphology of the films are characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). The devices exhibit good optical properties with low transmittance values in the coloured state, and the optical modulation is measured by spectrophotometer in the wavelength range from 400 to 800nm. The average visible light transmittance reaches 50.2% and 3.7% in bleached and coloured state, respectively. The results indicate that such a monolithic system has great potential to be applied in smart windows.
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Keywords:
81.15.Cd
82.47.Tp
83.80.Ab
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Received: 16 November 2007
Published: 30 January 2008
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PACS: |
81.15.Cd
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(Deposition by sputtering)
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82.47.Tp
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(Electrochemical displays)
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83.80.Ab
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(Solids: e.g., composites, glasses, semicrystalline polymers)
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