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Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System |
| HUNDUR Yakup1;GUVENC Ziya B2;HIPPLER Rainer3 |
| 1Department of Physics, Istanbul Technical University, Istanbul, TR-34469, Turkey2Electronic and Communication Engineering, Cankaya University, Balgat, Ankara, TR-06530, Turkey 3Institut fur Physik, Ernst-Moritz-Arndt Universitate Greifswald, Greifswald, D-17489, Germany |
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| Cite this article: |
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HUNDUR Yakup, GUVENC Ziya B, HIPPLER Rainer 2008 Chin. Phys. Lett. 25 730-733 |
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Abstract The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL
potential. Ni atom emission from the lattice is analysed over the range of 20--50eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical andexperimental data.
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| Keywords:
79.20.Rf
02.70.Ns
71.18.Bn
82.20.Wt
68.35.-p
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Received: 10 August 2007
Published: 30 January 2008
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| PACS: |
79.20.Rf
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(Atomic, molecular, and ion beam impact and interactions with surfaces)
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02.70.Ns
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(Molecular dynamics and particle methods)
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71.18.Bn
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82.20.Wt
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(Computational modeling; simulation)
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68.35.-p
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(Solid surfaces and solid-solid interfaces: structure and energetics)
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61.82.Bg
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(Metals and alloys)
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