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Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes |
ZHOU Zhu-Wen1;M. A. LIEBERMAN2;Sungjin KIM2;JI Shi-Yin1;DENG Ming-Sen1;SUN Guang-Yu 1 |
1Department of Physics, Guizhou Educational College, Guiyang 5500032Department of Electrical Engineering and Computer Sciences-1770, University of California, Berkeley CA 94720, USA |
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Cite this article: |
ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM et al 2008 Chin. Phys. Lett. 25 707-710 |
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Abstract Low-frequency (2.72--3.70Hz) relaxation oscillations at 100mTorr at higher absorbed power were observed from time-varying optical emission of the main discharge chamber and the periphery. We interpret the low frequency oscillations using an electromagnetic model of the slot impedance with parallel connection variational peripheral capacitance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions.
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Keywords:
52.35.-g
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Received: 21 October 2007
Published: 30 January 2008
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PACS: |
52.35.-g
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(Waves, oscillations, and instabilities in plasmas and intense beams)
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[1]Tsai W, Mueller G, Lindquist R, Frazier B and Vahedi V 1996 J. Vac. Sci. Technol. B 14 3276 [2] Lieberman M A, Lichtenberg A J, Kim Sungjin, Gudmundsson JT, Keil D L and Kim Jisoo 2006 Plasma Sources Sci. Technol. 15 276 [3] Lieberman M A and Lichtenberg A J 2005 Principles ofPlasma Discharges and Materials Processing 2nd edn (New York:Wiley) pp 408--436 [4] Lieberman M A, Booth J P, Chabert P, Rax J M and Turner MM 2002 Plasma Sources Sci. Technol. 11 283 [5] Kim S J, Zhou Z W, Lieberman M A and Lichtenberg A J 2006 J. Appl. Phys. 100 103302 [6] Kim S J, Lieberman M A, Lichtenberg A J and Gudmundsson JT 2006 J. Vac. Sci. Technol. A 24 2025 [7] Zhou Z W, Lieberman M A and Kim S J 2006 Chin. Phys.Lett. 23 2251 [8] Zhou Z W, Lieberman M A and Kim S J 2007 Chin. Phys. 16 758 |
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