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Thermal Diffusivity of Film/Substrate Structures Characterized by Transient Thermal Grating Method |
XU Xiao-Dong1;MA Di1;ZHANG Shu-Yi1;LUO Ai-Hua1;KIYOTAKA Wasa1,2 |
| 1Laboratory of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing 2100932Department of Micro-engineering, Kyoto University, Kyoto 606-8501, Japan |
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| Cite this article: |
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XU Xiao-Dong, MA Di, ZHANG Shu-Yi et al 2008 Chin. Phys. Lett. 25 176-179 |
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Abstract Transient thermal grating method is used to measure the thermal diffusivity of absorbing films deposited on transparent substrates. According to periodically modulated dielectric constant variations and thermoelastic deformations of the thin films caused by the transient thermal gratings, an improved optical diffraction theory is presented. In the experiment, the probing laser beam reflectively diffracted by the thermal grating is measured by a photomultiplier at different grating fringe spaces. The thermal diffusivity of the film can be
evaluated by fitting the theoretical calculations of diffraction signals to the experimental measured data. The validity of the method is tested by measuring the thermal diffusivities of absorbing ZnO films deposited on glass substrates.
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| Keywords:
44.10.+i
65.60.+a
66.70.-f
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Received: 01 October 2007
Published: 27 December 2007
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| PACS: |
44.10.+i
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(Heat conduction)
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65.60.+a
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(Thermal properties of amorphous solids and glasses: heat capacity, thermal expansion, etc.)
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66.70.-f
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(Nonelectronic thermal conduction and heat-pulse propagation in solids;thermal waves)
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