Chin. Phys. Lett.  2007, Vol. 24 Issue (9): 2671-2674    DOI:
Original Articles |
Structure Stability of LaAlO3 Thin Films on Si Substrates
HE Meng;LIU Guo-Zhen;XIANG Wen-Feng;Lü Hui-Bin;JIN Kui-Juan;ZHOU Yue-Liang;YANG Guo-Zhen
Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
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HE Meng, LIU Guo-Zhen, XIANG Wen-Feng et al  2007 Chin. Phys. Lett. 24 2671-2674
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Abstract A series of amorphous and single-crystalline LaAlO3 (LAO) thin films are fabricated by laser molecular-beam epitaxy technique on Si substrates under various conditions of deposition. The structure stability of the LAO films annealed in high temperature and various ambients is studied by x-ray diffraction as well as high-resolution transmission electron microscopy. The results show that the epitaxial LAO films have very good stability, and the structures of amorphous LAO thin films depend strongly on the conditions of deposition and post-annealing. The results reveal that the formation of LAO
composition during the deposition is very important for the structure stability of LAO thin films.
Keywords: 77.55.+f      68.60.Dv      61.10.Nz     
Received: 17 April 2007      Published: 16 August 2007
PACS:  77.55.+f  
  68.60.Dv (Thermal stability; thermal effects)  
  61.10.Nz  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2007/V24/I9/02671
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HE Meng
LIU Guo-Zhen
XIANG Wen-Feng
Lü Hui-Bin
JIN Kui-Juan
ZHOU Yue-Liang
YANG Guo-Zhen
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