Effect of Process Parameters on Laser Damage Threshold of TiO<SUB>2</SUB> Coatings

Chin. Phys. Lett.

2007, Vol. 24

Issue (9): 2606-2608 DOI:

Original Articles

Effect of Process Parameters on Laser Damage Threshold of TiO₂ Coatings

YAO Jian-Ke ^1,2;JIN Yun-Xia¹;ZHAO Yuan-An¹;HE Hong-Bo¹;SHAO Jian-Da¹;FAN Zheng-Xiu¹

¹R&D Centre for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800²Graduate School, Chinese Academy of Sciences, Beijing 100080

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YAO Jian-Ke, JIN Yun-Xia, ZHAO Yuan-An et al 2007 Chin. Phys. Lett. 24 2606-2608

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Abstract We investigate the laser damage behaviour of an electron-beam-deposited TiO₂ monolayer at different process parameters. The optical properties, chemical composition, surface defects, absorption and laser-induced damage threshold (LIDT) of films are measured. It is found that TiO₂ films with the minimum absorption and the highest LIDT can be fabricated using a TiO₂ starting material after annealing. LIDT is mainly related to absorption and is influenced by the non-stoichiometric defects for TiO₂films. Surface defects show no evident effects on LIDT in this experiment.

Keywords: 42.79.Wc 68.37.Yz 68.60.Wm

Received: 02 March 2007 Published: 16 August 2007

PACS:	42.79.Wc	(Optical coatings)
	68.37.Yz	(X-ray microscopy)
	68.60.Wm	(Other nonelectronic physical properties)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y2007/V24/I9/02606

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	YAO Jian-Ke
	JIN Yun-Xia
	ZHAO Yuan-An
	HE Hong-Bo
	SHAO Jian-Da
	FAN Zheng-Xiu

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