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Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process |
| YAO Jian-Ke1,3;LI Hai-Yuan 2,3;FAN Zheng-Xiu1;TANG Yong-Xing2;JIN Yun-Xia1;ZHAO Yuan-An1;HE Hong-Bo1;SHAO Jian-Da1 |
| 1R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Shanghai 2018002National Laboratory of High Power Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Shanghai 2018003Graduate School of the Chinese Academy of Sciences, Beijing 100049 |
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YAO Jian-Ke, LI Hai-Yuan, FAN Zheng-Xiu et al 2007 Chin. Phys. Lett. 24 1964-1966 |
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Abstract TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density and
roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.
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42.79.Wc
68.55.Jk
68.60.Wm
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Received: 27 March 2007
Published: 25 June 2007
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