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Structural, Optical and Electrical Properties of ZnS/Porous Silicon Heterostructures |
WANG Cai-Feng1;LI Qing-Shan 1,2;LV Lei 1;ZHANG Li-Chun 1,QI Hong-Xia 1;CHEN Hou3 |
1 Department of Physics, Qufu Normal University, Shandong 2731652 Department of Physics, Ludong University, Shandong 2640253 School of Chemistry and Materials Science, Ludong University, Shandong 264025 |
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Cite this article: |
WANG Cai-Feng, LI Qing-Shan, LV Lei et al 2007 Chin. Phys. Lett. 24 825-827 |
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Abstract ZnS films are deposited by pulsed laser deposition on porous silicon (PS) substrates formed by electrochemical anodization of p-type (100) silicon wafer. Scanning electron microscope images reveal that the surface of ZnS films is unsmoothed, and there are some cracks in the ZnS films due to the roughness of the PS surface. The x-ray diffraction patterns show that the ZnS films on PS surface are grown in preferring orientation along cubic phase β-ZnS (111) direction. White light emission is obtained by combining the blue-green emission from ZnS films with the orange--red emission from PS layers. Based on the I--V characteristic, the ZnS/PS heterojunction exhibits the rectifying junction behaviour, and an ideality factor n is calculated to be 77 from the I--V plot.
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Keywords:
78.55.Et
78.55.Mb
78.67.Pt
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Received: 05 September 2006
Published: 08 February 2007
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PACS: |
78.55.Et
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(II-VI semiconductors)
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78.55.Mb
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(Porous materials)
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78.67.Pt
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(Multilayers; superlattices; photonic structures; metamaterials)
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[1] Cullis A G, Canham L T and Calcott P D J 1997 J. Appl.Phys. 82 909 [2] Canham L T 1990 Appl. Phys. Lett. 57 1046 [3] Bai Y Z, Wang C L, Jin Z S, Lv X Y and Zou G T 1995 Chin.Phys. Lett. 12 435 [4] Liu Y L, Liu Y C, Yang H, Wang W B, Ma J G, Zhang J Y, Lu Y M, ShenD Z and Fan X W 2003 J. Phys. D: Appl. Phys. 36 2705 [5] Xu D S, Guo G L, Gui L L, Tang Y Q, Shi Z J, Jin Z X, Gu Z N, Liu WM, Li X L and Zhang G H 1999 Appl. Phys. Lett. 75 481 [6] Fan S, Chapline M G, Franklin N R, Tambler T W, Cassell A M and DaiH 1999 Science 283 512 [7] Sham T K, Coulthard I, Lorimer J W, Hiraya A and Watanabe M1994 Chem. Mater. 6 2085 [8] Coulthard I, Degan S, Zhu Y -J and Sham T K 1998 Can. J.Chem. 76 1707 [9] Coulthard I and Sham T K 1998 Solid State Commun. 105751 [10] Zhu Y -J, Coulthard I and Sham T K 1999 J. SynchrotronRadiat. 6 529 [11] Zhang P, Kim P K and Sham T K 2001 J. Electron Spectrosc.Relat. Phenom. 119 229 [12] Gros-Jean M, Herino R and Linocot D 1998 J. Electrochem.Soc. 145 2448 [13] Zhang P, Kim P S and Sham T K 2002 J. Appl. Phys. 916038 [14] Gokarna Anisha, Pavaskar N R, Sathaye S D, Ganesan V and BhoraskarS V 2002 J. Appl. Phys. 92 2118 [15] Gao T, Meng G W and Wang T H 2004 Chin. Phys. Lett. 21959 [16] Yoo Y Z, Chikyow T, Ahmet P, Jin Z W, Kawasaki M and Koinuma H2002 J. Cryst. Growth. 237 1594 [17] Ethiraj A S, Hebalkar N, Kulkarni S K, Pasricha R, Urban J, Dem C,Schmitt M, Kiefer W, Weinhardt L, Joshi S, Fink R, Heske C, Kumpf C andUmbach E 2003 J. Chem. Phys. 118 8945 [18] Velumani S and Ascencio J A 2004 Appl. Phys. A 79 153 [19] Morozova N K, Karetnikov I A, Plotnichenko V G, Gavrishchuk E M,Yashina E V and Ikonnikov V B 2004 Semiconductors 38 36 [20] Yano S, Schroeder R, Sakai H and Ullrich B 2003 Appl. Phys.Lett. 82 2026 [21] Nasrallah T Ben, Amlouk M, Bernede J C and Belgacem S 2004 Phys. Status Solidi A 201 3070 |
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