| Original Articles |
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Fabrication of Two-Dimensional Photonic Crystals with Controlled Defects by Combination of Holographic Lithography and Two-Photon Polymerization |
| SHEN Xiao-Xia1;YU Xiao-Qiang2;YANG Xiu-Lun1;CAI Lv-Zhong1;WANG Yu-Rong1;DONG Guo-Yan1;MENG Xiang-Feng1;XU Xian-Feng1 |
| 1Department of Optics, Shandong University, Jinan 2501002Institute of Crystal Materials, Shandong University, Jinan 250100 |
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| Cite this article: |
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SHEN Xiao-Xia, YU Xiao-Qiang, YANG Xiu-Lun et al 2007 Chin. Phys. Lett. 24 3160-3163 |
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Abstract A new ternary photopolymer system is used in fabricating photonic crystals (PhCs) with controlled defects by combination of single-photon and two-photon photopolymerization. The former process can produce PhCs in one-step recording with a low-power (tens mW) continuous-wave laser at 532nm, while the latter can create desired defects. The preparation of the material, the optical setup and the preliminary experimental results are given. Compared with other methods, this approach is much more accessible and convenient for use of visible light and has advantages of making PhCs in a large scale quickly and economically and introducing any defects exactly, especially for three-dimensional structures.
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| Keywords:
42.70.Qs
42.40.Kw
82.35.Lt
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Received: 15 March 2007
Published: 23 October 2007
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| PACS: |
42.70.Qs
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(Photonic bandgap materials)
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42.40.Kw
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(Holographic interferometry; other holographic techniques)
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82.35.Lt
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