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Influence of Annealing Temperature on Structure, Optical Loss andLaser-Induced Damage Threshold of TiO2 Thin Films |
| 1College of Material Science and Engineering, China Jiliang University, Hangzhou 3100182School of Material Science and Engineering, Shandong University of Technology, Zibo 2550493Shanghai Institute of Optics and Fine Mechanics, Chinese Academy ofSciences, Shanghai 201800 |
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TIAN Guang-Lei, WU Shi-Gang, YANG Lu-Yun et al 2007 Chin. Phys. Lett. 24 2967-2969 |
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Abstract TiO2 thin films are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for 4h, the spectra and XRD patterns of the TiO2 thin film are obtained. Weak absorption of coatings is measured by the surface thermal lensing technique, and laser-induced damage threshold (LIDT) is determined. It is found that with the increasing annealing temperature, the transmittance of TiO2 films decreases.
Especially when coatings are annealed at high temperature over 1173K, the optical loss is very serious. Weak absorption detection indicates that the absorption of coatings decreases firstly and then increases, and the absorption and defects play major roles in the LIDT of TiO2 thin films.
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78.20.-e
68.55.Jk
81.15.Ef
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Received: 20 June 2007
Published: 20 September 2007
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