| Original Articles |
|
|
|
|
Break Cohesion of Metal Contacts due to Voltage Bias |
| LI Yu-Xian |
| College of Physics, Hebei Normal University, Shijiazhuang 050016 |
|
| Cite this article: |
|
LI Yu-Xian 2006 Chin. Phys. Lett. 23 2560-2562 |
|
|
|
Abstract The instability of metal point contacts under voltage bias is calculated based on scattering theory. When the bias is applied, the transport channels will be closed and the chemical bonds will be broken, which modify the cohesive force of the point contact. If the cross section of the contact is narrow enough, an applied bias will break the point contact, which is in agreement with the experimental results. The effect of bias-dependent force can play an important role in the stability of a nanosize device.
|
| Keywords:
73.63.Rt
76.60.Es
71.15.Ap
|
|
|
Published: 01 September 2006
|
|
| PACS: |
73.63.Rt
|
(Nanoscale contacts)
|
| |
76.60.Es
|
(Relaxation effects)
|
| |
71.15.Ap
|
(Basis sets (LCAO, plane-wave, APW, etc.) and related methodology (scattering methods, ASA, linearized methods, etc.))
|
|
|
|
|
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
