| Original Articles |
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Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy |
| WU Liang-Cai1;LIU Bo1;SONG Zhi-Tang1,2;FENG Gao-Ming1;FENG Song-Lin2;CHEN Bomy3 |
| 1Laboratory of Nanotechnology, Research Center of Functional Semiconductor Film Engineering and Technology, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050
2State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050
3Silicon Storage Technology, Inc., 1171 Sonora Court, Sunnyvale, CA 94086, USA |
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| Cite this article: |
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WU Liang-Cai, LIU Bo, SONG Zhi-Tang et al 2006 Chin. Phys. Lett. 23 2557-2559 |
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Abstract Phase change memory (PCM) cell array is fabricated by a standard complementary metal--oxide--semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50nm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current--voltage characteristics, indicating the phase transition from an amorphous state (higher resistance state) to the crystalline state (lower resistance state). The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low (only several μA). An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2×106rad(Si), which makes it attractive for space-based applications.
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| Keywords:
73.61.Jc
85.30.De
81.40.Wx
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Published: 01 September 2006
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| PACS: |
73.61.Jc
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(Amorphous semiconductors; glasses)
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85.30.De
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(Semiconductor-device characterization, design, and modeling)
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81.40.Wx
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(Radiation treatment)
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