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Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing |
JIANG Zhu-Qing;TAO Shi-Quan;YUAN Wei;LIU Guo-Qing;WANG Da-Yong |
College of Applied Sciences, Beijing University of Technology, Beijing 100022 |
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Cite this article: |
JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei et al 2006 Chin. Phys. Lett. 23 2749-2752 |
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Abstract The optical erasure dynamics in a batch-thermal fixing scheme of holographic storage in photorefractive crystals is investigated theoretically and experimentally. The inter-batch optical erasure time constant τF is introduced to specify the optical erasure to compensated gratings, and measured in a sophisticated experiment. The experimental result shows that τF is much longer than the intra-batch optical erasure time constant τE. The difference between τF and τE is fundamental for enhancing nonvolatile storage density.
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Keywords:
42.40.Pa
42.40.Ht
42.20.Lx
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Published: 01 October 2006
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