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Analysis of X-Ray Photoelectron Spectroscopy of Polymethyl Methacrylate Etched by a KrF Excimer Laser |
| ZHU Xiao-Li;LIU Shi-Bing;CHEN Tao;JIANG Yi-Jian,ZUO Tie-Chuan |
| College of Laser Engineering, Beijing University of Technology, Beijing 100022 |
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| Cite this article: |
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ZHU Xiao-Li, LIU Shi-Bing, CHEN Tao et al 2005 Chin. Phys. Lett. 22 1526-1529 |
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Abstract The C 1s and O 1s electrons in polymethyl methacrylate etched by different incident laser intensities are analysed by x-ray photoelectron spectroscopy. The results show that when the incident laser fluence increases gradually, the percentage of carbon atoms in C-C bonds decreases while the one in carbonyl group (C=O) and alkoxy group (C-O) increases, and the percentage of oxygen atoms in C=O bonds increases while the one in C--O bonds decreases. Based on the analysis of the chemical structure, the energy level transition, energy diversion, and dissociation of bonds are theoretically examined, which is consistent with the experimental results.
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| Keywords:
78.66.Qn
78.55.Kz
79.60.-i
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Published: 01 June 2005
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| PACS: |
78.66.Qn
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(Polymers; organic compounds)
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78.55.Kz
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(Solid organic materials)
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79.60.-i
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(Photoemission and photoelectron spectra)
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