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Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope |
| XU Tie-Jun;XU Ji-Ying;WANG Jia;TIAN Qian |
| State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084 |
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| Cite this article: |
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XU Tie-Jun, XU Ji-Ying, WANG Jia et al 2004 Chin. Phys. Lett. 21 1644-1647 |
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Abstract We investigate optical near-field distributions of the unconventional C-apertures and the conventional square apertures in preliminary experiment with an aperture scanning near-field optical microscope. These nano-apertures are fabricated in Au film on a glass substrate with focused ion beam technology. The experimental results indicate the uptrend of output light intensity that a C-aperture enables the intensity maximum to increase at least 10 times more than a square aperture with same unit length. The measured near-field light spot sizes of C-aperture and square aperture with 200-nm unit length are 439nm×500nm and 245nm×216nm, respectively.
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| Keywords:
78.67.-n
07.79.Fc
68.37.Uv
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Published: 01 August 2004
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| PACS: |
78.67.-n
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(Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures)
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07.79.Fc
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(Near-field scanning optical microscopes)
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68.37.Uv
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(Near-field scanning microscopy and spectroscopy)
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