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Silicon-on-Insulator-Based Compact Optical Demultiplexer Employing Etched Diffraction Grating |
| WANG Wen-Hui1;TANG Yan-Zhe2;WANG Yun-Xiang3;QU Hong-Chang1;WU Ya-Ming1;LI Tie1;YANG Jian-Yi1,2;WANG Yue-Lin1,2;LIU Ming3 |
| 1State Key Laboratories of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050
2Department of Information Science and Electronics Engineering, Zhejiang University, Hangzhou 310027
3Microelectronics R&D Centre, Chinese Academy of Sciences, Beijing 100029 |
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| Cite this article: |
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WANG Wen-Hui, TANG Yan-Zhe, WANG Yun-Xiang et al 2004 Chin. Phys. Lett. 21 1265-1267 |
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Abstract A compact optical demultiplexer with etched diffraction grating (EDG) is designed and fabricated on a silicon-on-insulator (SOI) material. Several 90°turning mirrors are used to bend the waveguides, and the size of the EDG-based demultiplexer is minimized to only 16 x 1.7mm2. The crosstalk is about 18 dB. The on-chip loss is about 18.2 dB, which is composed of about 16.9 dB excess loss and 1.3 dB diffraction loss. Measures to improve the performance are discussed.
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| Keywords:
42.25.Fx
42.70.Nq
42.79.Dj
42.79.Sz
42.82.Et
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Published: 01 July 2004
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| PACS: |
42.25.Fx
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(Diffraction and scattering)
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42.70.Nq
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(Other nonlinear optical materials; photorefractive and semiconductor materials)
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42.79.Dj
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(Gratings)
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42.79.Sz
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(Optical communication systems, multiplexers, and demultiplexers?)
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42.82.Et
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(Waveguides, couplers, and arrays)
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