Dynamic Scaling in Growth of ZrO<suB>2</suB> Thin Films Prepared by Electronic Beam Evaporation

Chin. Phys. Lett.

2003, Vol. 20

Issue (5): 709-712 DOI:

Original Articles

Dynamic Scaling in Growth of ZrO₂ Thin Films Prepared by Electronic Beam Evaporation

QI Hong-Ji¹;HUANG Li-Hua²;YUAN Jing-Mei¹;CHENG Chuan-Fu¹;SHAO Jian-Da¹;FAN Zheng-Xiu¹

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 ²Laser Technology and Engineering Research Institute, Huazhong University of Science and Technology, Wuhan 430074

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QI Hong-Ji, HUANG Li-Hua, YUAN Jing-Mei et al 2003 Chin. Phys. Lett. 20 709-712

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Abstract The growth front evolution of ZrO₂ thin films deposited by electronic beam evaporation has been studied with atomic force microscopy. The dynamic scaling characteristics are observed during the deposition process. After numerical correlation analysis, the roughness exponent α = 0.80±0.005 and the growth exponent β = 0.141 are all obtained. Based on these results, we suggest that the growth of ZrO₂ thin films can be described by the combination of the Edwards-Wilkinson equation, the Mullins diffusion equation and the shadowing effect.

Keywords: 68.55.Jk 77.55.+f 81.15.Ef 68.37.Ps

Published: 01 May 2003

PACS:	68.55.Jk
	77.55.+f
	81.15.Ef
	68.37.Ps	(Atomic force microscopy (AFM))

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y2003/V20/I5/0709

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	QI Hong-Ji
	HUANG Li-Hua
	YUAN Jing-Mei
	CHENG Chuan-Fu
	SHAO Jian-Da
	FAN Zheng-Xiu

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