Chin. Phys. Lett.  2002, Vol. 19 Issue (6): 850-853    DOI:
Original Articles |
Barriers Formation on YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination
Abbas A. Essa;KANG Lin;XU Wei-Wei;YANG Sen-Zu;WU Pei-Heng
Research Institute of Superconductor Electronic, Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093
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Abbas A. Essa, KANG Lin, XU Wei-Wei et al  2002 Chin. Phys. Lett. 19 850-853
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Abstract We investigate the surface structure and composition of
YBa2Cu3Oy (YBCO) thin film modified by CF4 plasma fluorination. In addition to the absorption of hydrocarbons, chemical reactions of the YBCO surface take place during CF4 plasma treatment. Various x-ray photoelectron spectroscopic data are reported and discussed, and the existence of a thin barrier is confirmed, which homogeneously covers the edge of the base YBCO film in our interface engineering Josephson junction. Measurements of Auger electron spectroscopic data and the resistance versus temperature indicate that the barrier is a controllable-insulating layer.
Keywords: 74.60.Ge      74.50.+r      74.20.-z     
Published: 01 June 2002
PACS:  74.60.Ge  
  74.50.+r (Tunneling phenomena; Josephson effects)  
  74.20.-z (Theories and models of superconducting state)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2002/V19/I6/0850
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Abbas A. Essa
KANG Lin
XU Wei-Wei
YANG Sen-Zu
WU Pei-Heng
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