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Influence of Combination of Casimir Force and Residual Stress on the Behaviour of Micro- and Nano-Electromechanical Systems |
ZHENG Mao-Sheng;ZHOU Gen-Shu;ZHAO Wen-Zhen;GU Hai-Cheng |
State Key Laboratory for Mechanical Behavior of Materials,
Xi’an Jiaotong University, Xi’an 710049
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Cite this article: |
ZHENG Mao-Sheng, ZHOU Gen-Shu, ZHAO Wen-Zhen et al 2002 Chin. Phys. Lett. 19 832-834 |
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Abstract Casimir force and residual stresses actually appear in over-layers or films simultaneously, the study of the behaviour of micro-/nano-electromechanical systems in the presence of Casimir force and residual stress is of significance to the design of the relevant devices. We derive analytical expressions of the deflection of a bridge shaped device under the mutual actions of Casimir force and residual stress in films. It is shown that the tensile residual stress enhances wavy behaviour of the deflection, while the compressive residual stress increases the deflection value and reduces the wavy behaviour.
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Keywords:
62.20.-x
62.20.Dc
62.20.Fe
62.20.Mk
83.50.-v
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Published: 01 June 2002
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