Chin. Phys. Lett.  2002, Vol. 19 Issue (4): 581-583    DOI:
Original Articles |
Influences of Annealing on the Opto-electronic Properties of ZnO Films Grown by Plasma-Enhanced MOCVD
WANG Jin-Zhong1;DU Guo-Tong1;WANG Xin-Qiang1;CHANG Yu-Chun1;YAN Wei1;YANG Shu-Ren1;MA Yan1;WANG Hai-Song1;GAO Ding-San1;LIU Xiang2;CAO Hui2;XU Jun-Ying2;R. P. H. Chang2
1Department of Electronic Engineering and Key Laboratory on Integrated Photoelectronics, Jilin University, Changchun 130023 2Material Research Center, Northwestern University, Evanston, Illinois, U.S.A.
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WANG Jin-Zhong, DU Guo-Tong, WANG Xin-Qiang et al  2002 Chin. Phys. Lett. 19 581-583
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Abstract ZnO thin films have been grown on C-plane sapphire substrates by plasma-enhanced metal-organic chemical vapor deposition. The samples are then annealed at a higher temperature. The resistivity, concentration of electron, mobility and optically pumped threshold of both as-grown and annealed films are investigated. Furthermore, their structural and optical properties are also examined with x-ray diffraction, emission spectra and optical transmission spectra. The results indicate that the quality of ZnO thin films can be improved by annealing.

Keywords: 81.05.-t      81.15.Gh      78.20.-e     
Published: 01 April 2002
PACS:  81.05.-t (Specific materials: fabrication, treatment, testing, and analysis)  
  81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))  
  78.20.-e (Optical properties of bulk materials and thin films)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2002/V19/I4/0581
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WANG Jin-Zhong
DU Guo-Tong
WANG Xin-Qiang
CHANG Yu-Chun
YAN Wei
YANG Shu-Ren
MA Yan
WANG Hai-Song
GAO Ding-San
LIU Xiang
CAO Hui
XU Jun-Ying
R. P. H. Chang
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