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Influences of Annealing on the Opto-electronic Properties of
ZnO Films Grown by Plasma-Enhanced MOCVD
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WANG Jin-Zhong1;DU Guo-Tong1;WANG Xin-Qiang1;CHANG Yu-Chun1;YAN Wei1;YANG Shu-Ren1;MA Yan1;WANG Hai-Song1;GAO Ding-San1;LIU Xiang2;CAO Hui2;XU Jun-Ying2;R. P. H. Chang2 |
1Department of Electronic Engineering and Key Laboratory on Integrated Photoelectronics, Jilin University, Changchun 130023
2Material Research Center, Northwestern University, Evanston, Illinois, U.S.A. |
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Cite this article: |
WANG Jin-Zhong, DU Guo-Tong, WANG Xin-Qiang et al 2002 Chin. Phys. Lett. 19 581-583 |
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Abstract ZnO thin films have been grown on C-plane sapphire substrates by plasma-enhanced metal-organic chemical vapor deposition. The samples are then annealed at a higher temperature. The resistivity, concentration of electron, mobility and optically pumped threshold of both as-grown and annealed films are investigated. Furthermore, their structural and optical properties are also examined with x-ray diffraction, emission spectra and optical transmission spectra. The results indicate that the quality of ZnO thin films can be improved by annealing.
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Keywords:
81.05.-t
81.15.Gh
78.20.-e
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Published: 01 April 2002
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PACS: |
81.05.-t
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(Specific materials: fabrication, treatment, testing, and analysis)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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78.20.-e
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(Optical properties of bulk materials and thin films)
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