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Determination of Oxidation States in Magnetic Multilayers |
| YU Guang-Hua1,2;LI Ming-Hua1,2;ZHU Feng-Wu1;CHAI Chun-Lin2,3;LAI Wu-Yan2 |
| 1Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
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| Cite this article: |
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YU Guang-Hua, LI Ming-Hua, ZHU Feng-Wu et al 2002 Chin. Phys. Lett. 19 266-268 |
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Abstract X-ray photoelectron spectroscopy has been used to characterize the oxidation states in Ta/NiOx/Ni81Fe19/Ta magnetic multilayers prepared by rf reaction and dc magnetron sputtering. The exchange coupling field and the coercivity of NiOx/Ni81Fe19 are studied as a function of the ratio of Ar to O2 during the deposition process. The chemical states of Ni atoms in the interface region of NiOx/NiFe were also investigated by XPS and the peak decomposition technique. The results show that the ratio of Ar to O2 has a great effect on the chemical states of nickel in NiOx films. Thus the exchange coupling field and the coercivity of Ta/NiOx/Ni81Fe19/Ta are affected seriously. Also, the experiment shows that XPS is a powerful tool in characterizing magnetic multilayers.
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| Keywords:
75.70.Cn
82.80.Pv
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Published: 01 February 2002
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| PACS: |
75.70.Cn
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(Magnetic properties of interfaces (multilayers, superlattices, heterostructures))
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82.80.Pv
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(Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.))
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