Chin. Phys. Lett.  1999, Vol. 16 Issue (6): 426-427    DOI:
Original Articles |
Preparation of TiOx/γ-AI2O3 Catalyst on Powdery γ-AI2O3 by Using Reactive Sputtering Deposition
LU Wen-qi1;XU Zhen-feng2;DENG Xin-lu1;XU Jun1;ZHANG Jia-liang1;ZHU Ai-min1;GONG Wei-min1
1State Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024 2Dandong Textile College, Dandong 118003
Cite this article:   
LU Wen-qi, XU Zhen-feng, DENG Xin-lu et al  1999 Chin. Phys. Lett. 16 426-427
Download: PDF(149KB)  
Export: BibTeX | EndNote | Reference Manager | ProCite | RefWorks
Abstract A layer of TiOx was deposited on powdery γ-AI2O3 by using flat-target magnetron sputtering in microwave electron cyclotron resonance plasma. A vibrator was developed to coat the γ-AI2O3 particles evenly by TiOx. The conversion efficiency of methane and both the yield and the selectivity of C2 hydrocarbons and C2H2 were revealed to be superior to that by conventional chemical method. The use of vibrator is effective.
Keywords: 52.75.Rx     
Published: 01 June 1999
PACS:  52.75.Rx  
TRENDMD:   
URL:  
https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y1999/V16/I6/0426
Service
E-mail this article
E-mail Alert
RSS
Articles by authors
LU Wen-qi
XU Zhen-feng
DENG Xin-lu
XU Jun
ZHANG Jia-liang
ZHU Ai-min
GONG Wei-min
Related articles from Frontiers Journals
[1] WU Xu-Feng, XU Chun-Xiang, ZHU Guang-Ping, LING Yi-Ming. ZnO Nanorods Produced by the Method of Arc Discharge[J]. Chin. Phys. Lett., 2006, 23(8): 426-427
[2] JIN Qin-Hua, HU Pei-Gang, LING Hao, WU Jia-Da, SHI Li-Qun, ZHOU Zhu-Ying. Helium-Charged Titanium Films Deposited by Pulsed Laser Deposition in an Electron-Cyclotron-Resonance Helium Plasma Environment [J]. Chin. Phys. Lett., 2003, 20(3): 426-427
[3] AN Zheng-Hua, ZHANG Miao, MEN Chuan-Ling, SHEN Qin-Wo, LIN Zi-Xin, LI Kai-Cheng, LIN Cheng-Lu. Behaviour of Oxygen-Implanted and Hydrogen-Implanted SiGe/Si Heterostructure[J]. Chin. Phys. Lett., 2002, 19(3): 426-427
[4] ZHANG Tao, ZHANG Hui-Xing, Ian. G. Brown, Paul K. Chu. Assistant Anode in a Cathodic Arc Plasma Source[J]. Chin. Phys. Lett., 2001, 18(8): 426-427
[5] GONG Xue-Yu, X. R. Duan, H. Lange, A. A. Meyer-Plath. Detection of NH2 Radical in Ammonia Radio-Frequency Plasmas by Laser-Induced Resonance Fluorescence[J]. Chin. Phys. Lett., 2001, 18(7): 426-427
[6] LIU Ming-Hai, HU Xi-Wei, YU Guo-Yang, WU Qin-Chong, PAN Yuan. Preliminary Analysis of Hysteresis Phenomenon in Electron Cyclotron Resonance Plasma[J]. Chin. Phys. Lett., 2001, 18(4): 426-427
[7] XU Jun, MA Teng-Cai, LU Wen-Qi, XIA Yuan-Liang, DENG Xin-Lu. A New Method for Thin Film Deposition-Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct-Current Magnetron Sputtering[J]. Chin. Phys. Lett., 2000, 17(8): 426-427
[8] LE Zi-chun, L. Dreeskornfeld, S. Rahn, R. Segler, U. Kleineberg, U. Heinzmann. Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer[J]. Chin. Phys. Lett., 1999, 16(9): 426-427
[9] ZHAO Jian-hua, LI Yan-chun, LIU Ri-ping, ZHANG Xiang-yi, ZHOU Zhen-hua, WANG Chao-ying, XU Ying-fan, WANG Wen-kui,. Growth and Morphology of β–FeSi2 Single Crystal with Chemical Vapor Transport[J]. Chin. Phys. Lett., 1999, 16(3): 426-427
[10] LIU Bao-jun, LI De-jun, GU Han-qing. F+ Ion Implantation for Enhancing Surface Hydrophobicity of Medical Polymethylmethacrylate[J]. Chin. Phys. Lett., 1998, 15(9): 426-427
[11] LI De-jun, CUI Fu-zhai, FENG Qing-ling, ZHAO Jie. Oxygen Ion Beam and Plasma Induced Blood Compatibility of Polyetherurethane[J]. Chin. Phys. Lett., 1997, 14(7): 426-427
[12] ZHAO Jing, KANG Ning, XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. Chin. Phys. Lett., 1996, 13(4): 426-427
Viewed
Full text


Abstract