X-Ray Nonspecular Scattering from Amorphous Mo Films

Chin. Phys. Lett.

1997, Vol. 14

Issue (3): 190-193 DOI:

Original Articles

X-Ray Nonspecular Scattering from Amorphous Mo Films

MA Hong-ji;JIANG Xiao-ming;CUI Ming-qi;XIAN Ding-chang

Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039

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MA Hong-ji, JIANG Xiao-ming, CUI Ming-qi et al 1997 Chin. Phys. Lett. 14 190-193

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Abstract X-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures. The results show that with the increase of Ar pressure, the density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abnormal glow discharging in the sputtering processes interprets the observed results well.

Keywords: 61.10.-i 68.55.Jk 81.15.Cd

Published: 01 March 1997

PACS:	61.10.-i
	68.55.Jk
	81.15.Cd	(Deposition by sputtering)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1997/V14/I3/0190

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	MA Hong-ji
	JIANG Xiao-ming
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