Deposition of Diamond Film on Aluminum Nitride Ceramics and the
Study of Their Thermal Conductance

Chin. Phys. Lett.

1996, Vol. 13

Issue (8): 625-628 DOI:

Original Articles

Deposition of Diamond Film on Aluminum Nitride Ceramics and the Study of Their Thermal Conductance

CHEN Hong;ZHANG Ji-fa;CUI Jing-biao;FANG Rong-chuan^*

Department of Physics, ^*also Structure Research Laboratory, University of Science and Technology of China, Hefei 230026

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CHEN Hong, ZHANG Ji-fa, CUI Jing-biao et al 1996 Chin. Phys. Lett. 13 625-628

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Abstract Diamond films (DF) have been deposited on AlN ceramic substrates by hot filament chemical vapour deposition method. The diamond nucleation on AlN ceramics has been investigated. A nucleation density more than 10⁸ cm^-2 was obtained on this kind of insulating polycrystalline substrate under common deposition conditions. The thermal conductance of the DF/AlN compound materials has been studied by photothermal deflection technique. The thermal diffusivity of the DF/AlN is higher than that of the AlN ceramics, and will increase as the diamond films grow thicker.

Keywords: 81.15.Gh 68.60.Dv

Published: 01 August 1996

PACS:	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
	68.60.Dv	(Thermal stability; thermal effects)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1996/V13/I8/0625

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