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Diffuse Reflectance Fourier Transform Infrared Spectrometry of BN Films Deposited on Steels by Remote Microwave Plasma CVD from Borazine |
LEI Ming-kai;MA Teng-cai;V. A. Emel kin* |
National Laboratory of Material Modification, Dalian University of Technology, Dalian 116024
*Institute of Thermophysics, Siberian Branch of Russian Academy of Sciences. Novosibirsk 630090, Russia |
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Cite this article: |
LEI Ming-kai, MA Teng-cai, V. A. Emel kin 1996 Chin. Phys. Lett. 13 309-313 |
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Abstract The diffuse reflectance Fourier transform infrared spectra of the boron nitride (BN) films deposited on steels by remote microwave plasma chemical vapour deposition (CVD) from borazine with nitrogen, hydrogen and argon were investigated in the wavenumber range of 400-4000cm-1. It was found that the cubic BN formation depends on production of the intermediate species of cyclotriborazane ((BH2NH2)3) and its dehydrogenation. The structural bonds of cyclotriborazane are similar to that of cubic BN. Optimum conditions for deposited BN films were found to be the borazine-nitrogen mixture at the substrate temperature of 550°C. The BN films were a mixture of crystalline cubic BN accounting for the major content and hexagonal BN with relatively low hydrogen content.
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Keywords:
81.15.Gh
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Published: 01 April 1996
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PACS: |
81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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